Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

Chen, M.; Nijboer, M. P.; Kovalgin, A. Y.; Nijmeijer, A.; Roozeboom, F.; Luiten-Olieman, M. W. J.

doi:10.1039/d3dt01204b

Cited by 9 publications

(1 citation statement)

References 145 publications

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“…However, technical advances in recent years suggest that the impact of these negative factors can be reduced. In particular, we should note the development of technically simpler technologies such as atmospheric pressure ALD [142,143] and faster roll-to-roll ALD, spatial ALD [19], as well as the emergence of techniques that avoid the use of plasma to produce silver [123,144]. We believe that the advancement of these technologies could greatly augment the likelihood of extensive application of ALD in the manufacturing of antibacterial-coated materials within the industry.…”

Section: Advantages Disadvantages and Perspectives Of Aldmentioning

confidence: 99%

Atomic Layer Deposition of Antibacterial Nanocoatings: A Review

Nazarov,

Kozlova,

Rogacheva

et al. 2023

Antibiotics

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In recent years, antibacterial coatings have become an important approach in the global fight against bacterial pathogens. Developments in materials science, chemistry, and biochemistry have led to a plethora of materials and chemical compounds that have the potential to create antibacterial coatings. However, insufficient attention has been paid to the analysis of the techniques and technologies used to apply these coatings. Among the various inorganic coating techniques, atomic layer deposition (ALD) is worthy of note. It enables the successful synthesis of high-purity inorganic nanocoatings on surfaces of complex shape and topography, while also providing precise control over their thickness and composition. ALD has various industrial applications, but its practical application in medicine is still limited. In recent years, a considerable number of papers have been published on the proposed use of thin films and coatings produced via ALD in medicine, notably those with antibacterial properties. The aim of this paper is to carefully evaluate and analyze the relevant literature on this topic. Simple oxide coatings, including TiO2, ZnO, Fe2O3, MgO, and ZrO2, were examined, as well as coatings containing metal nanoparticles such as Ag, Cu, Pt, and Au, and mixed systems such as TiO2-ZnO, TiO2-ZrO2, ZnO-Al2O3, TiO2-Ag, and ZnO-Ag. Through comparative analysis, we have been able to draw conclusions on the effectiveness of various antibacterial coatings of different compositions, including key characteristics such as thickness, morphology, and crystal structure. The use of ALD in the development of antibacterial coatings for various applications was analyzed. Furthermore, assumptions were made about the most promising areas of development. The final section provides a comparison of different coatings, as well as the advantages, disadvantages, and prospects of using ALD for the industrial production of antibacterial coatings.

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Section: Advantages Disadvantages and Perspectives Of Aldmentioning

confidence: 99%

Atomic Layer Deposition of Antibacterial Nanocoatings: A Review

Nazarov,

Kozlova,

Rogacheva

et al. 2023

Antibiotics

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Electrodeposition of Polymer Networks as Conformal and Uniform Ultrathin Coatings

Wang,

Resing,

Brown

et al. 2024

Advanced Materials

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Natural systems, synthetic materials, and devices almost always feature interphases that control the flow of mass and energy or stabilize interfaces between incompatible materials. With technologies transitioning to non‐planar and 3D mesoscale architectures, novel deposition methods for realizing ultrathin coatings and interphases are required. Polymer networks are of particular interest for their tunable chemical and physical properties combined with their structural integrity. Here, the electrodeposition of polymer networks (EPoN) is introduced as a general approach to uniformly coat non‐planar conductive materials. Conceptually, EPoN utilizes electrochemically activated crosslinkers as polymer end groups to confine their network formation exclusively to the material surface upon charge transfer, yielding a passivating and self‐limiting growth of conformal and uniform coatings with tunable submicron thickness on conductive materials. EPoN is found to result in thin functional films of various polymer backbones and side group chemistries as demonstrated for poly(ether) and poly(acrylamide) based polymers as solid electrolyte and thermally responsive interphases, respectively.

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P‐10.1: Design and Optimization of Al₂O₃/Alucone Overlapping Film for Improved Water‐Oxygen Barrier Performance of Flexible Displays

Zhao,

Peng,

Chen

et al. 2024

Symp Digest of Tech Papers

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Thin‐film encapsulation plays an essential role in the stability of flexible displays. Although Al2O3 film has good water‐oxygen barrier properties, its bending performance needs to be enhanced. This paper inserts Alucone into Al2O3 film to generate Al2O3/Alucone overlapping film with good barrier and bending performance to improve the encapsulated devices. The finite element analyzing approach and the calcium dot arrays test are employed to investigate the influence of structural ratio and overlapping density on the water‐oxygen barrier and mechanical properties of the Al2O3/Alucone overlapping film. The results show that the proportion of Alucone sublayers in the Al2O3/Alucone overlapping film (with a total thickness of 60 nm) is directly proportional to the overlapping structure's ability to disperse stresses and inversely proportional to the overlapping structure's water‐oxygen barrier property. When the Al2O3/Alucone overlapping structure ratio is 1:1, the Al2O3/Alucone overlapping film can balance the bending and barrier properties. The bending property of Al2O3/Alucone overlapping film (Al2O3/Alucone ratio is 1:1, total thickness is 60 nm) diminishes with increasing overlapping density, and its water‐oxygen barrier property increases and then drops. Combining the results of the simulation and calcium dot arrays test, it is apparent that when the Al2O3/Alucone ratio is 1:1 and the overlapping density is 5, the Al2O3/Alucone overlapping film has good bending and barrier performance. This is expected to promote the development of commercial flexible display technology.

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Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

Abstract: Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin conformal films with excellent thickness control at Ångström or (sub)monolayer level. Atmospheric-pressure ALD is an upcoming ALD process...

Cited by 9 publications

References 145 publications

Atomic Layer Deposition of Antibacterial Nanocoatings: A Review

Atomic Layer Deposition of Antibacterial Nanocoatings: A Review

Electrodeposition of Polymer Networks as Conformal and Uniform Ultrathin Coatings

P‐10.1: Design and Optimization of Al₂O₃/Alucone Overlapping Film for Improved Water‐Oxygen Barrier Performance of Flexible Displays

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Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

Abstract: Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin conformal films with excellent thickness control at Ångström or (sub)monolayer level. Atmospheric-pressure ALD is an upcoming ALD process...

Cited by 9 publications

References 145 publications

Atomic Layer Deposition of Antibacterial Nanocoatings: A Review

Atomic Layer Deposition of Antibacterial Nanocoatings: A Review

Electrodeposition of Polymer Networks as Conformal and Uniform Ultrathin Coatings

P‐10.1: Design and Optimization of Al2O3/Alucone Overlapping Film for Improved Water‐Oxygen Barrier Performance of Flexible Displays

Contact Info

Product

Resources

About

P‐10.1: Design and Optimization of Al₂O₃/Alucone Overlapping Film for Improved Water‐Oxygen Barrier Performance of Flexible Displays