Availability of layered certified reference materials for industrial application of glow discharge spectrometric depth profiling

The article contains sections titled: 1. Total‐Reflection X‐ray Fluorescence Analysis (TXRF) 1.1. Principles 1.2. Instrumentation 1.3. Spectral Information 1.4. Quantification 1.5. Applications 1.5.1. Particulate and Film‐Type Surface Contamination 1.5.2. Semiconductors 1.5.2.1. Depth Profiling by TXRF and Multilayer Structures 1.5.2.2. Vapor Phase Decomposition (VPD) and Droplet Collection 2. Glow Discharge Optical Emission Spectroscopy (GD‐OES) 2.1. Principles 2.2. Instrumentation 2.3. Spectral Information 2.4. Quantification 2.5. Depth Profiling 2.6. Applications 3. Surface‐Sensitive IR and Raman Spectroscopy; Ellipsometry 3.1. Reflection ‐ Absorption IR Spectroscopy (RAIRS) 3.1.1. Principles 3.1.2. Instrumentation and Applications 3.2. Surface Raman Spectroscopy 3.2.1. Principles 3.2.2. Surface‐Enhanced Raman Scattering (SERS) 3.2.2.1. Instrumentation 3.2.2.2. Spectral Information 3.2.2.3. Applications 3.2.3. Nonlinear Optical Spectroscopy 3.3. UV ‐ VIS ‐ IR Ellipsometry (ELL) 3.3.1. Principles 3.3.2. Instrumentation 3.3.3. Applications 4. Other Photon‐Detecting Techniques 4.1. Appearance‐Potential Methods 4.1.1. Soft X‐Ray Appearance‐Potential Spectroscopy (SXAPS) 4.1.2. Disappearance‐Potential Spectroscopy (DAPS) 4.2. Inverse Photoemission Spectroscopy (IPES) and Bremsstrahlung Isochromat Spectroscopy (BIS) 4.3. Ion‐Beam Spectrochemical Analysis (IBSCA)

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Glow Discharge Optical Emission Spectroscopy (GD‐OES)

Hoffmann¹,

Quentmeier²

2011

Surface and Thin Film Analysis

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Availability of layered certified reference materials for industrial application of glow discharge spectrometric depth profiling

Cited by 9 publications

References 41 publications

Surface and Thin-Film Analysis

Surface and Thin-Film Analysis

Surface and Thin‐Film Analysis, 4 Photon Detection

Glow Discharge Optical Emission Spectroscopy (GD‐OES)

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