Block copolymer lithography for scalable near-infrared graphene plasmonic devices

Siegel, Joel; Dwyer, Jonathan H.; Suresh, Anjali; Fortman, Margaret; Safron, Nathaniel S.; Wan, Chenghao; Choi, Jonathan W.; Wei, Wei; Saraswat, Vivek; Kats, Mikhail A.; Arnold, Michael S.; Gopalan, Padma; Brar, Victor W.

doi:10.1117/12.2571066

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII 2020

DOI: 10.1117/12.2571066

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Block copolymer lithography for scalable near-infrared graphene plasmonic devices

Joel Siegel

Jonathan H. Dwyer

Anjali Suresh

et al.

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Block copolymer lithography for scalable near-infrared graphene plasmonic devices

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