Boron phosphide films by reactive sputtering: Searching for a p-type transparent conductor

Abstract

With an indirect band gap in the visible and a direct band gap at a much higher energy, boron phosphide (BP) holds promise as an unconventional p-type transparent conductor. Previous experimental reports deal almost exclusively with epitaxial, nominally undoped BP films by chemical vapor deposition. High hole concentrations were often observed, but it is unclear if native defects alone can be responsible for it. Besides, the feasibility of alternative deposition techniques has not been clarified and optical characterization is generally lacking. In this work, we demonstrate reactive sputtering of amorphous BP films, their partial crystallization in a P-containing annealing atmosphere, and extrinsic doping by C and Si. We obtain the highest hole concentration reported to date for p-type BP (5 × 10 20 cm −3 ) using C doping under B-rich conditions. We also confirm that bipolar doping is possible in BP. An anneal temperature of at least 1000 °C is necessary for crystallization and dopant activation. Hole mobilities are low and indirect optical transitions are much stronger than predicted by theory. Low crystalline quality probably plays a role in both cases. High figures of merit for transparent conductors might be achievable in extrinsically doped BP films with improved crystalline quality.

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“…5 are consistent with this trend, with the notable exception of BP, which has equally large electron and hole mobilities (24). BP has recently been the subject of several computational and experimental studies as a potential p-type, nonoxide transparent conductor (25). Some of the materials with high hole mobility (>10 cm 2 /Vs) and large DFT bandgaps (>1 eV) are labeled in Fig.…”