Calculations of the chemical composition of helium–silane plasma

Strunin, V. I.; Kitaeva, E. A.; Khudaybergenov, G. Zh.

doi:10.1007/s11182-010-9393-2

Russ Phys J

2010

DOI: 10.1007/s11182-010-9393-2

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Calculations of the chemical composition of helium–silane plasma

V. I. Strunin

E. A. Kitaeva

G. Zh. Khudaybergenov

Abstract: A model describing the process of silane dissociation in a high-frequency helium plasma discharge is proposed. The concentrations of the silane dissociation products are calculated numerically, and the role of metastable helium atoms in the synthesis of film-forming radicals is analyzed.

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Calculations of the chemical composition of helium–silane plasma

Abstract: A model describing the process of silane dissociation in a high-frequency helium plasma discharge is proposed. The concentrations of the silane dissociation products are calculated numerically, and the role of metastable helium atoms in the synthesis of film-forming radicals is analyzed.

Cited by 0 publications

References 10 publications

No citations

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