1986
DOI: 10.1103/physrevb.33.3952
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Carrier transport through grain boundaries in semiconductors

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Cited by 378 publications
(227 citation statements)
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“…S9). This can be explained by the presence of a higher interfacial trap density at grain boundaries in the 2L sample 31,37 , and is also consistent with an increased density of high angle grain boundaries. Although these results have to be considered with caution because the slow wearing of the C-AFM tip that occurs with each scan can introduce a systematic error in the measurements, repeated scans in the same area yielded similar results and suggested that the systematic error was small (Supplementary Fig.…”
supporting
confidence: 54%
“…S9). This can be explained by the presence of a higher interfacial trap density at grain boundaries in the 2L sample 31,37 , and is also consistent with an increased density of high angle grain boundaries. Although these results have to be considered with caution because the slow wearing of the C-AFM tip that occurs with each scan can introduce a systematic error in the measurements, repeated scans in the same area yielded similar results and suggested that the systematic error was small (Supplementary Fig.…”
supporting
confidence: 54%
“…Ohmicða ¼ 1Þ; subOhmicða , 1Þ and exponential regionsða . 1Þ with an increase in the voltage [5,18]. This can be considered to depend on the density and the energy position of acceptorlike interface states in the band gap.…”
Section: Discussionmentioning
confidence: 99%
“…32,33 However, the microscopic origins of DSB are still un-fully identified, 32 though various models have been proposed focusing on the conduction mechanism since the discovery of non-ohmic properties of ZnO varistors by Matsuoka, 34 including the successful description by Pike, Blatter and Greuter. 1,33,35,36 So far, the intergranular layer, 34 segregation of additives, 37,38 thin disordered layer, 39 oxygen-excess defects like chemisorbed oxygen or excess amount of oxygen, 40,41 native point defects such as zinc vacancy (V Zn ) and oxygen interstitial (O i ), 2,15,42 and certain complex defect composed of additives and native defects 43 have all been considered as the possible candidates for promoting the generation of acceptor-states. In effect, recent successes in performing first-principles calculations on ZnO materials to consider the grain boundary structure, 2,32 dopant segregation 44 and defect formation [43][44][45] have made it possible to understand the formation of acceptor state from atomic scale.…”
Section: A Formation Of Double-schottky Barriermentioning
confidence: 99%
“…Bismuth or praseodymium is the critical additive as DSB activator that is frequently doped during sintering of ZnO varistors, among which those doped Bi-atoms could appear either as isolated atoms decorating the ZnO grain boundaries or as a thin amorphous Bi 2 O 3 layer (typical thickness as 0.6-1.5 nm 33,46 ) depending on the cooling process. 5,44 It has been debated in the literature which of these two types of Bi configurations give rise to the most pronounced nonlinearity.…”
Section: A Formation Of Double-schottky Barriermentioning
confidence: 99%
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