CD metrology for EUV lithography and etch

Johanesen, Hayley; Kenslea, Anne; Williamson, Mark; Knowles, Matt; Kwakman, L.F.Tz.; Puymbroeck, J. Van; Felder, Dan; Levi, Shimon; Nishry, Noam; Adan, Ofer; Englard, Ilan; Gov, S.; Cohen, Oded; Turovets, Igor

doi:10.1109/asmc.2015.7164505

2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2015

DOI: 10.1109/asmc.2015.7164505

|View full text |Cite

CD metrology for EUV lithography and etch

Hayley Johanesen¹,

Anne Kenslea²,

Mark Williamson³

et al.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2018

2019

Publication Types

Select...

Other3

Relationship

Self Cite0

Independent3

Authors

Journals

Cited by 3 publications

References 7 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

CD-TEM: Characterizing impact of TEM sample preparation on CD metrology

Kenslea

Hakala

Zhong

et al. 2018

2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

View full text Add to dashboard Cite

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

customersupport@researchsolutions.com

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

CD metrology for EUV lithography and etch

Cited by 3 publications

References 7 publications

CD-TEM: Characterizing impact of TEM sample preparation on CD metrology

CD-TEM: Characterizing impact of TEM sample preparation on CD metrology

Characterization of STEM alignments and their automation

Evaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices

Contact Info

Product

Resources

About