Abstract:Nanoparticles (NPs) of silica, ceria and alumina are used as polishing slurries for Chemical Mechanical Planarization (CMP). However, the regulations for use and toxic levels of ENPs in slurries are yet to be established. NPs’ reactivity along with their cellular toxicity and uptake are largely dependent on their physicochemical characteristics. This paper will also present the correlation between physicochemical properties of NPs and toxicity level so as to design and develop benign CMP ENPs. The current stud… Show more
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