Characterization of hard DC-sputtered Si-based TiN coatings: the effect of composition and ion bombardment

Ribeiro, E.; Rebouta, L.; Carvalho, S.; Vaz, F.; Fuentes, G. G.; Rodriguez, R.; Zazpe, M.; Alves, E.; Goudeau, P.; Rivière, J.P.

doi:10.1016/j.surfcoat.2004.08.020

Cited by 39 publications

(22 citation statements)

References 42 publications

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“…The two plots represent, as previously, three samples from each of the two sets of samples. The annealing led to a mixed behaviour that is characterized by both increase and decrease in hardness, which in fact was already observed for other systems [1,13,19]. In the first set of samples (Fig.…”

Section: Resultssupporting

confidence: 65%

“…Anyway, this unusual decrease of grain size might not be real since this could be not a single peak but a mixture of both O-doped nitride, Zr-N-O (solid solution), and undoped Zr-N phases, as it was claimed recently [2] and reported by R. Roch et al [7]. Similar behaviour has been extensively analysed and reported for the Ti-Si-N system [8][9][10]. From these results one can conclude that the annealing had an effect on the stress relief by structural relaxation of the films related to processes such as the annihilation of dislocations, effusion of interstitials, such as those of nitrogen or oxygen from the Zr-N lattice, among other structural defects [11,12].…”

Section: Resultssupporting

confidence: 64%

“…From these results one can conclude that the annealing had an effect on the stress relief by structural relaxation of the films related to processes such as the annihilation of dislocations, effusion of interstitials, such as those of nitrogen or oxygen from the Zr-N lattice, among other structural defects [11,12]. The relaxation of large compressive stresses is a well-known process and extensively reported in literature, such as the case of TiN for temperatures from 450 up to 700 8C [1,19], leading to significant film hardness decrease.…”

Section: Resultsmentioning

confidence: 93%

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Structural stability of decorative ZrNxOy thin films

Carvalho

Vaz

Rebouta

et al. 2005

Surface and Coatings Technology

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ZrN x O y thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400-800 8C. Residual stresses originated by the deposition process were partially or almost completely released with the annealing, which is consistent with the X-ray diffraction results. Samples with low oxygen fraction (0.10 b f O 2 b 0.22) showed no significant changes in hardness after thermal annealing at 800 8C. For intermediate and high oxygen fractions, an initial decrease in hardness at 600 8C annealing is followed by an inversion at the highest temperatures (700 and 800 8C, respectively), resulting from possible oxide phases crystallization, defect annealing at high temperatures and some extended phase segregations. The increase in the oxygen fraction is followed by a decrease of hardness in the as-deposited samples towards the values of bpureQ ZrO 2 . No significant changes in colour were observed with the annealing. D

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Section: Resultssupporting

confidence: 65%

Section: Resultssupporting

confidence: 64%

Section: Resultsmentioning

confidence: 93%

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Structural stability of decorative ZrNxOy thin films

Carvalho

Vaz

Rebouta

et al. 2005

Surface and Coatings Technology

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“…A significant density increase of the coatings was observed in the presence of the external magnetic field. The same system was used for deposition of Ti-Si-N coatings and it was found that, in addition to the ion/atom ratio and deposition rate, variation of the magnetic field near the substrate markedly affected the substrate temperature resulting in the formation of the stable nc-TiN/a-Si 3 N 4 nanocomposite [58]. The importance of the ion flux provided by a proper arrangement of the magnetic field was emphasized by Kim et al [60], where superhard Ti-Al-Si-N coatings were deposited by reactive sputtering.…”

Section: Magnetic Field Arrangementmentioning

confidence: 99%

Plasma assisted techniques for deposition of superhard nanocomposite coatings

Levchuk

2007

Surface and Coatings Technology

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Various techniques based on plasma application have been successfully used for deposition of superhard nanocomposite coatings. These techniques possess many varying parameters, which in turn influence the properties of a growing coating. Therefore it is important to reveal common regularities, if any, between the process parameters and properties of the coatings. The paper addresses this issue based on the results acquired by the application of plasma assisted CVD and PVD methods. Here it is shown how different deposition parameters, such as working gas pressure, bias and temperature, affect coating properties, mainly hardness. These parameters are found to have a complex influence and the effect caused by variation of one deposition parameter can be similar to that of another one.This presents an opportunity to improve other properties of the coating while maintaining the hardness.

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“…Vacuum-arc evaporation of cathode is a promising deposition method, which allows fabrication of multilayered coatings on the base of nitrides and carbides of transition metals [5][6][7][8]. A varying the deposition conditions, such as gas pressure in the deposition chamber, bias potential, bilayer thickness, etc.…”

Section: Introductionmentioning

confidence: 99%

Multilayered vacuum-arc nanocomposite TiN/ZrN coatings before and after annealing: Structure, properties, first-principles calculations

Pogrebnjak

Иващенко

Бондар

et al. 2017

Materials Characterization

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A B S T R A C TNanoscale multilayered TiN/ZrN films were deposited using sequential vacuum-arc deposition of Ti and Zr targets in a nitrogen atmosphere. Studies of film's properties were carried out using various modern methods of analysis, such as XRD, STEM, HRTEM, SIMS combined with results of nanoindentation and tribological tests. To interpret the mechanical properties of the deposited multilayer films first-principles calculations of TiN(111), ZrN(111) structures and TiN(111)/ZrN(111) multilayer were carried out. To study the influence of thermal annealing, several samples were annealed in air at the temperature 700°C. All deposited samples were highly polycrystalline with quite large 20-25 nm crystals. The crystalline planes were very ordinated and demonstrated an excellent coordinated growth. The nanohardness and elastic modulus of non-annealed coatings reached 42 GPa and 348 GPa, respectively. Annealing in air at the temperature 700°C led to partial oxidation of the multilayered coatings, however hardness of the non-oxidized part of the coatings remained as high, as for initial coatings. All deposited coatings demonstrate good wear resistance.

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Characterization of hard DC-sputtered Si-based TiN coatings: the effect of composition and ion bombardment

Cited by 39 publications

References 42 publications

Structural stability of decorative ZrNxOy thin films

Structural stability of decorative ZrNxOy thin films

Plasma assisted techniques for deposition of superhard nanocomposite coatings

Multilayered vacuum-arc nanocomposite TiN/ZrN coatings before and after annealing: Structure, properties, first-principles calculations

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