Characterization of two dimensional photonics structures using optical sccaterometry

Abstract

The technology of photonics structures has being still developed. The main problem, which this technology copy with, is characterization of geometrical parameters in a nano regime. The best method should be quick, easy to use, cheep and precise. Two popular methods such as microscopy AFM or SEM are expansive to maintain and use. Moreover the time of a measurement is long and the inspected area are relatively small. Majority photonic structures are periodic due to optical methods look quite promising. One of them is optical scatterometry which is the angle-resolved measurement and characterization of light scattered from a structure. This technique is able to precisely measure geometrical parameters of structures in the sub-micron size. Additionally scatterometry is quick and non-invasive method.In previous paper has been presented results of using this method to obtain profile one dimensional photonic crystal. In this paper is described the method to measure two dimensional nano-structures and results characterization of two dimensional photonic crystal PhC in photoresist obtained by holographic lithography.