“…In what follows, we make a short comparison with other methods currently available for the fabrication of 3D chiral nanostructures or metasurfaces at the nanoscale: Glancing angle deposition (GLAD) [ 127 , 128 , 129 , 130 , 131 , 132 , 133 , 134 , 135 ], multi-step electron beam lithography (EBL) [ 136 , 137 , 138 , 139 , 140 , 141 ], DNA Self-assembly [ 142 , 143 , 144 , 145 , 146 ], nanoimprint lithography (NIL) [ 147 , 148 ], and direct laser writing (DLW) [ 149 , 150 , 151 , 152 , 153 , 154 ].…”