2000
DOI: 10.1016/s0010-8545(99)00193-9
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Cobalt(III) complexes containing incomplete C3O4 or complete Co4O4 cubane core

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Cited by 43 publications
(30 citation statements)
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“…Reduced distances in this range are characteristic of layered oxides and have been observed in other cobalt oxide electrocatalysts indicating the presence of di-μ-oxo bridges. 39,40 Absence of this peak for films with greater Ti content indicates minimal structural order.…”
Section: Figure 2 Herementioning
confidence: 99%
“…Reduced distances in this range are characteristic of layered oxides and have been observed in other cobalt oxide electrocatalysts indicating the presence of di-μ-oxo bridges. 39,40 Absence of this peak for films with greater Ti content indicates minimal structural order.…”
Section: Figure 2 Herementioning
confidence: 99%
“…These distances are characteristic of edge-sharing octahedra in layered oxides, such as Li x CoO 2 [67], Na x CoO 2 [68], H x CoO 2 [69], and complexes with cubane cores, such as Co 4 ( -O) 4 [70][71][72]. The reported number of Co ions neighboring the X-ray-absorbing Co ion ranges between 3.3 and 5.3 [5,63,64], which implies the presence of only a few interconnected incomplete or complete cubane units (Co 3∕4 ( -O) 4 ; see Figure 9.2b).…”
Section: Structure and Structure-function Relationsmentioning
confidence: 99%
“…For tetrametallic clusters, one familiar motif is defect‐dicubane. It may be mentioned that there are a number of defect‐dicubane compounds having only 3d metal ions,[3b], [3c], [3d], [3e], [3f], [3g], only 4f metal ions[8e] and both 3d and 4f metal ions …”
Section: Introductionmentioning
confidence: 99%
“…The choice or design of ligands and self‐assembling[3h], [3i] are crucial for stabilizing clusters, , (as well as coordination polymers, CPs, ). The symmetric two‐compartmental Schiff base ligands (like H 3 L; two O(alcohol)N(imine)O(phenol) sites; Scheme ) that are obtained from [1+2] condensation of a 4‐R‐2,6‐diformylphenol (R = Me, Et, n ‐butyl, tert ‐butyl, Cl, CF 3 , etc.)…”
Section: Introductionmentioning
confidence: 99%