2015 IEEE International Conference on Communications (ICC) 2015
DOI: 10.1109/icc.2015.7248332
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Coding scheme for 3D vertical flash memory

Abstract: Abstract-Recently introduced 3D vertical flash memory is expected to be a disruptive technology since it overcomes scaling challenges of conventional 2D planar flash memory by stacking up cells in the vertical direction. However, 3D vertical flash memory suffers from a new problem known as fast detrapping, which is a rapid charge loss problem. In this paper, we propose a scheme to compensate the effect of fast detrapping by intentional inter-cell interference (ICI). In order to properly control the intentional… Show more

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Cited by 14 publications
(8 citation statements)
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“…They also proposed to track the optimum read reference voltage for 3D NAND using three read operations. Another prior work [20] proposed to tackle fast-drift by enhancing the data encoding process based on sideinformation. While the annealing process does not treat shallow-trapped electrons, it can still be used orthogonally with our ERR scheme.…”
Section: Related Workmentioning
confidence: 99%
“…They also proposed to track the optimum read reference voltage for 3D NAND using three read operations. Another prior work [20] proposed to tackle fast-drift by enhancing the data encoding process based on sideinformation. While the annealing process does not treat shallow-trapped electrons, it can still be used orthogonally with our ERR scheme.…”
Section: Related Workmentioning
confidence: 99%
“…Both architectures have a physically large cell size (indicated with the feature process size F process ), mainly due to a channel width wider than planar devices, although offering a smaller equivalent area occupation due to the stacking of multiple tiers [21,22]. The former solution does not offer any advantage over conventional planar CT cells in terms of P/E and retention, whereas the latter allows improving the cells programming performance, compared to planar devices, thanks to the shape of the CT cell, also known as Gate-All-Around (GAA) [23,24]. Nevertheless, 3D NAND memories face new reliability issues because of the cylindrical shape and the multi-layer stacking.…”
Section: Threshold Voltage Shift During Sensingmentioning
confidence: 99%
“…The 3D vertical flash memory has a nitride layer inside an Oxide-NitrideOxide (ONO) stack, which acts as a CT layer along the circumference of the thin poly-silicon vertical channel. Please note that each CT cell in this 3D vertical NAND memory is surrounded by the metal gates [24].…”
Section: Threshold Voltage Shift During Sensingmentioning
confidence: 99%
“…Consequently, the retrieved signal suffers from the inter-cell interference (ICI) due to the intensified coupling between neighboring cells, as well as other channel impairments [9], [10], [11]. To alleviate the ICI effect, channel signal processing schemes accounting the cell-to-cell interference are investigated such as soft information extraction scheme [12], [13] and coding with side information [14], which showed potential error rate performance improvement. In addition, various quantization schemes for NAND flash are suggested [15], [16], where the resolution of readback signal or the threshold voltage of the cell is limited by the number of read operations, while the programmed and erased voltage distributions are asymmetric.…”
Section: Introductionmentioning
confidence: 99%