Coherent Epitaxy and Magnetic Properties of Sr2FeMoO6 Thin Films on Ba0.4Sr0.6TiO3-Buffered SrTiO3 Substrates

Unlocking the potential of half-metallicSr2FeMoO6films through controlled stoichiometry and double-perovs

“…[12] motivated numerous studies in fabrication of epitaxial films of Sr 2 FeMoO 6 , using pulsed laser deposition (PLD) and sputtering [13][14][15][16][17][18][19][20][21][22][23][24][25][26]. However, it has proven challenging to grow Sr 2 FeMoO 6 films that are stoichiometric, phase pure, fully epitaxial and exhibit a high degree of Fe/Mo ordering.…”

“…It is generally believed that for deposition of complex oxide epitaxial films using magnetron sputtering, off-axis geometry with high sputtering gas pressure (typically above 100 mTorr) is needed to minimize energetic bombardment [28]. Previously, magnetron sputtering in H 2 /Ar at a total pressure of 76 mTorr was used to deposit Sr 2 FeMoO 6 films [20][21][22][23][24] and in only one study was the film stoichiometry characterized [21]. [29], the systematic variation of stoichiometry in a series of samples synthesized at similar conditions demonstrates the significant effect of stoichiometry on the magnetization [27].…”

Studies on strain relaxation and in-plane orientation of La0.7Ca0.3MnO3 film by grazing incidence X-ray diffraction

“…[17], dislocations in LCMO film deposited on MgO substrate appear within 2 nm from interface. In addition, Asano et al [18] found that Sr 2 FeMoO 6 films with relatively large lattice mismatch (f = −1%) grew incoherently on bare SrTiO 3 substrates. We reasonably believed that LCMO films grew incoherently in the initial growth stage on MgO substrate due to even larger lattice mismatch.…”

Challenges in Sr2FeMoO6−δ Thin Film Deposition

“…The out‐of‐plane lattice parameter results from an unconstrained minimization of atomic forces. It is usually expanded with respect to bulk value regardless of the sign of lattice mismatch of the substrate and decreases toward the bulk value with increasing growth temperature and decreasing deposition rate . With the increase of film thickness, strain in the SFMO thin film becomes relaxed toward the bulk lattice parameter values .…”

“…With the increase of film thickness, strain in the SFMO thin film becomes relaxed toward the bulk lattice parameter values . A general trend in SFMO films is that the smaller the lattice parameter, the better the magnetic film properties . Strain relaxation of SFMO thin films on SrTiO 3 (001) occurs in the range of 30–80 nm …”