Cold atmospheric plasma: Sources, processes, and applications

Bárdoš, Ladislav; Baránková, Hana

doi:10.1016/j.tsf.2010.07.044

Cited by 396 publications

(283 citation statements)

References 82 publications

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“…The corona discharge structure is spatially non-uniform and is affected by the geometry of the set up. From an industrial point of view, corona discharge receives a great deal of attention because it can be applied to bulk gases in the atmospheric or higher pressures at a low temperature (Bárdos and Baránková, 2010). Cold plasma is stable and in steady condition for a long period of time (Misra et al, 2017).…”

Section: Corona Dischargementioning

confidence: 99%

“…An optimization study on the production of stable microplasma in air and argon by the use of 2.45 GHz microwave excitation was conducted by Gregório et al (2009). Although high power levels are often needed for plasma generation in 9 microwave systems, the waveguide dimensions may limit the size of the plasma reactor (Bárdos and Baránková, 2010).…”

Section: Microwave Dischargementioning

confidence: 99%

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Cold atmospheric plasma manipulation of proteins in food systems

Tolouie

Mohammadifar

Ghomi

et al. 2017

Critical Reviews in Food Science and Nutrition

145

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Section: Corona Dischargementioning

confidence: 99%

Section: Microwave Dischargementioning

confidence: 99%

Cold atmospheric plasma manipulation of proteins in food systems

Tolouie

Mohammadifar

Ghomi

et al. 2017

Critical Reviews in Food Science and Nutrition

145

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“…Plasma enhanced chemical vapor deposition of silicon-organic films at atmospheric pressure (AP-PECVD) is commonly performed with a wide variety of precursors [15][16][17][18]. The most prominent class of precursors in use is alcoxysilanes (e.g.…”

Section: Surface and Coatings Technology 295 (2016) 112-118mentioning

confidence: 99%

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Schäfer

Hnilica

Šperka

et al. 2016

Surface and Coatings Technology

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a b s t r a c t a r t i c l e i n f oPlasma enhanced chemical vapor deposition (PECVD) from tetrakis(trimethylsilyloxy)silane (TTMS) has been studied at atmospheric pressure. TTMS has been chosen because of its unique 3D structure with potential to form nano-structured organosilicon polymers. Despite the widespread surveying of various silicon-organic molecules for PECVD, the use of TTMS in AP-PECVD has not been investigated deeper yet. PECVDs have been performed with two different plasma jets. While they are alike regarding the geometry and injection of TTMS, they differ in input power and excitation frequency. The radiofrequency plasma jet operates at lower power densities as compared to the microwave plasma jet. Despite this all the deposited films exhibit similar chemical properties resembling that of silicon dioxide (Si:O = 1:2) with carbon content below 5%. The films demonstrate a broad variety of morphologies from compact smooth films to nano-dendritic 3D structures depending on the particular process.

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“…Plasma can be defined as a partly or fully ionized gas containing charged and neutral particles, e.g. electrons, positive and negative ions, molecules, radicals and atoms [3,[15][16][17]. In recent years, the use of plasma treatment of polymers for modification of their surface properties has been studied as an environmentally friendly alternative to the wet chemical techniques [1,11,15,18].…”

Section: Introductionmentioning

confidence: 99%

Influence of plasma treatment on wettability and scratch resistance of Ag-coated polymer substrates

Wojcieszak

Poniedziałek

Mazur

et al. 2016

Materials Science-Poland

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Rapid progress in thin-film coatings based on metals, which can be deposited on polymers, has been recently observed. In this work discussion on the properties of modified polymers and silver thin films deposited on polytetrafluoroethylene (PTFE) and polycarbonate (PC) substrates has been presented. Surface of these polymer substrates were exposed to argon plasma discharge. Additionally, silver thin films were deposited on their surface by electron beam evaporation method. The surfaces of the modified polymers were studied by different methods, i.e. topography, wettability and scratch resistance measurements were performed. The ageing effect of treated substrates was also discussed. It was shown that plasma modification of PTFE and PC substrates increased wettability of their surfaces. The value of water contact angle decreased of about 40 % and 25 % for PTFE and PC surface, respectively. The change of hydrophobic to hydrophilic properties was observed. Plasma modification of substrates improved adhesion between silver coating and polymer substrates. However, it did not influence wettability of Ag coating.

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Cold atmospheric plasma: Sources, processes, and applications

Cited by 396 publications

References 82 publications

Cold atmospheric plasma manipulation of proteins in food systems

Cold atmospheric plasma manipulation of proteins in food systems

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Influence of plasma treatment on wettability and scratch resistance of Ag-coated polymer substrates

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