Comment on “Smooth relaxed Si0.75Ge0.25 layers on Si(001) via <i>in situ</i> rapid thermal annealing” [Appl. Phys. Lett. 83, 4321 (2003)]

Chrastina, D.

doi:10.1063/1.1828574

Applied Physics Letters

2004

DOI: 10.1063/1.1828574

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Comment on “Smooth relaxed Si0.75Ge0.25 layers on Si(001) via in situ rapid thermal annealing” [Appl. Phys. Lett. 83, 4321 (2003)]

D. Chrastina

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Comment on “Smooth relaxed Si0.75Ge0.25 layers on Si(001) via in situ rapid thermal annealing” [Appl. Phys. Lett. 83, 4321 (2003)]

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References 17 publications

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