Abstract:The ferroelectric field-effect transistor (FeFET) is one of the most promising candidates for emerging nonvolatile memory devices owing to its low write energy and high ION/IOFF ratio. For FeFET applications as nonvolatile memory devices, 1FeFET, 1T-1FeFET, 2T-1FeFET, and 3T-1FeFET cells have been proposed. The 1FeFET cell exhibits the highest density but suffers from write disturbance. Although the 1T-1FeFET and 2T-1FeFET cells resolve the write disturbance, they use a write scheme with a negative write volta… Show more
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