Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning

Hung, Kuei-Chun; Lin, B. N.; Chang, Hsien-an; Tseng, Alex; Chung, Lien-Sheng; Liu, WeiJyh; Wu, Der-Yuan; Huang, Peter

doi:10.1117/12.388974

SPIE Proceedings

2000

DOI: 10.1117/12.388974

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Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning

Kuei-Chun Hung

B. N. Lin

Hsien-an Chang

et al.

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Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning

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