2021
DOI: 10.1016/j.diamond.2021.108555
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Comparison of surface and subsurface damage of mosaic single-crystal diamond substrate processed by mechanical and plasma-assisted polishing

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Cited by 14 publications
(4 citation statements)
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“…As shown in figure 8(c), the minimum surface roughness Sq of the SCD (100) substrate polished by this device can reach 0.32 nm. To demonstrate that PAP is a nondestructive polishing technology, Liu et al [120] detected subsurface damage of SCD (100) substrates after MP and PAP through scanning cathodoluminescence (CL) with band A emission (central wavelength = 432 nm). Band A emission is considered to be caused by dislocation, sp 2 hybrid structure, and other internal damage in diamond [121,122].…”
Section: Papmentioning
confidence: 99%
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“…As shown in figure 8(c), the minimum surface roughness Sq of the SCD (100) substrate polished by this device can reach 0.32 nm. To demonstrate that PAP is a nondestructive polishing technology, Liu et al [120] detected subsurface damage of SCD (100) substrates after MP and PAP through scanning cathodoluminescence (CL) with band A emission (central wavelength = 432 nm). Band A emission is considered to be caused by dislocation, sp 2 hybrid structure, and other internal damage in diamond [121,122].…”
Section: Papmentioning
confidence: 99%
“…Currently, PAP is only successfully used for polishing SCD substrates. In [46,51,119,120], Ar-based oxygen plasma was selected for the PAP of diamond. The polishing accuracy of PAP is extremely high, and [46] the surface roughness Sq of the polished SCD surface is below 0.5 nm, with a maximum MRR of 13.3 µm h −1 .…”
Section: Papmentioning
confidence: 99%
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“…Oxygenplasma functionalisation of oral implant biomaterials is used for controlling implant surface wettability [22]. Surface and subsurface damage of a mosaic single-crystal diamond (100) substrate can be cured through plasma-assisted polishing [23]. Moreover, surface chemical and surface function modification by plasma can effectively improve the gas sensing performance of sensors [24].…”
Section: Introductionmentioning
confidence: 99%