2008
DOI: 10.1039/b811817e
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Complex micropatterning of periodic structures on elastomeric surfaces

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Cited by 120 publications
(152 citation statements)
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“…The first regime is now described by λ/λ 0 ∼ (ǫ/ǫ 0 ) −1/2 , whereas the second regime obeys λ/λ 0 ∼ (ǫ/ǫ 0 ) −1/3 . The expected evolution of the wavelength of this system contrasts from the case of a plain rigid sheet or even a thin ribbon deposited on a thick soft substrate [6,[8][9][10]16,18] or at the surface of a liquid [30] under uniaxial compression, where the wavelength of the wrinkles does not depend on the applied strain. Indeed this last situation corresponds to λ ≫ h m and considering the bending of the membrane would not be relevant.…”
Section: -P2mentioning
confidence: 90%
“…The first regime is now described by λ/λ 0 ∼ (ǫ/ǫ 0 ) −1/2 , whereas the second regime obeys λ/λ 0 ∼ (ǫ/ǫ 0 ) −1/3 . The expected evolution of the wavelength of this system contrasts from the case of a plain rigid sheet or even a thin ribbon deposited on a thick soft substrate [6,[8][9][10]16,18] or at the surface of a liquid [30] under uniaxial compression, where the wavelength of the wrinkles does not depend on the applied strain. Indeed this last situation corresponds to λ ≫ h m and considering the bending of the membrane would not be relevant.…”
Section: -P2mentioning
confidence: 90%
“…The period of wrinkles is determined by the competing dependence of strain energy on period in the film versus in the base. Several different techniques have been developed in the past to (i) generate and join/bond the film to the base [12][13][14], (ii) generate moduli mismatch [12,[15][16][17], and (iii) apply uniaxial [6,12,13] and equibiaxial strains [14,[18][19][20] to the film. Analytical and computational predictive models for uniaxial [11,21] and equibiaxial strains [22] have also been developed.…”
Section: Introductionmentioning
confidence: 99%
“…film drying), in both uni-and multi-axial geometries. Whilst several film fabrication methods yield laminate structures [25][26][27][28][29][30][31] , surface modification of the substrate material is an attractive route to skin formation due to its simplicity, good adhesion inter-layer adhesion properties promoting resilience to delamination upon strain 25,[32][33][34][35] . Elastomeric polydimethylsiloxane (PDMS) has been the substrate of choice for soft lithography 36 , in part due to its optical transparency, nm-replication fidelity, surface adhesion and bulk mechanical properties, and ease of handling.…”
Section: Introductionmentioning
confidence: 99%