“…A C C E P T E D M A N U S C R I P T ACCEPTED MANUSCRIPT 18 To sputter materials, several types of the techniques are used, such as: ion beam [216][217][218][219][220][221][222][223][224][225][226], radio-frequency (RF) magnetron [227-244k], pulsed laser [58,75,232,, electroncyclotron-resonance plasma [266][267][268], diode, direct current and reactive sputtering or deposition [269,270]. However, since CaPO 4 belong to the electrically insulating materials, the last three techniques cannot be used for their spattering.…”