Cover Picture: Plasma Process. Polym. 2/2007

Heyse, Pieter; Dams, Roel; Paulussen, Sabine; Houthoofd, Kristof; Janssen, Kris P. F.; Jacobs, Pierre; Sels, Bert F.

doi:10.1002/ppap.200790002

Cited by 28 publications

(48 citation statements)

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“…However, the concentration of middle-sized fragments in the active volume of the discharge during plasma deposition of AMA (C 3 H 5 þ and C 4 H 5 O þ ) and PiB (C 3 H 7 þ and C 4 H 7 O þ ) both tended to decrease. In literature, the chemical analysis of thin plasma films based on FTIR, XPS, [15,16] solid state 13 C NMR, [17] optical emission spectroscopy (OES), [18] electron spin resonance spectroscopy (ESR), [19,20] mass spectrometry, [21] and secondary ion mass spectroscopy (SIMS) [22][23][24] is predominant.…”

Section: Introductionmentioning

confidence: 99%

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Scheltjens

Ponte

Paulussen

et al. 2015

Plasma Process. Polym.

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Allyl methacrylate (AMA), methyl methacrylate (MMA), and propyl isobutyrate (PiB) are plasma deposited at ambient temperature in an atmospheric DBD reactor to assess the effect of precursor carbon double bond unsaturations. The specific plasma deposition rate (k 0 ) as a function of the Yasuda factor (Y f ) is quantified empirically by:Fourier transform infrared analysis indicates a loss of carbonyl functionalities with increasing plasma power, and Raman microscopy shows C5 5C double bonds in all plasma films. The methacrylate-like plasma films are found to be heterogeneous with a volatile and a cross-linked fraction observed by thermogravimetric analysis. Differential scanning calorimetry reveals a low glass transition temperature and a characteristic residual reactivity of the coatings.

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Section: Introductionmentioning

confidence: 99%

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Scheltjens

Ponte

Paulussen

et al. 2015

Plasma Process. Polym.

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“…Dielectric barrier discharges (DBD) are among those most used for this purpose [4][5][6] . However, this work focuses on the deposition by means of an atmospheric pressure plasma jet.…”

Section: Introductionmentioning

confidence: 99%

Hydrophobic coatings deposited with an atmospheric pressure microplasma jet

Vogelsang¹,

Ohl²,

Foest³

et al. 2010

J. Phys. D: Appl. Phys.

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Successful plasma polymerisation of a fluorocarbon compound (c-C 4 F 8 ) using an atmospheric pressure plasma jet is described. The source is operated with argon as working gas at a flow rate of 6 slm and 10 -100 sccm admixtures of c-C 4 F 8 . Deposition is limited to a discharge regime with strong localization and was observed for conductive substrates only (Al and Si). The deposition process is characterized by a high local growth rate (40 nm/s) and produces films which show a Teflon-like chemical structure and hydrophobicity. The coatings are characterised using X-ray photo electron spectroscopy (XPS), profilometry, and Scanning electron microscopy (SEM). Changing the ambient atmosphere from protective N 2 to normal air only reduces the deposition rate but does not change the chemistry of the film.Based on the results of parameter variations and the electrical relations of the jet-setup, the special form of the deposition regime of the jet is discussed and considered to be a γ-mode discharge dependent on the choice of substrate material.Confidential: not for distribution.

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“…operating in standard PECVD mode. This suggests that the use of precursor in the liquid state as nebulised droplets is not required to achieve SPP, as has been suggested elsewhere [1], [2], [3], [18], [19], [20], [21]. Vapour deposition showed high retention of monomer molecular structure in the coating combined with excellent cross-linking and durability, the two key SPP parameters of merit.…”

Section: Discussionmentioning

confidence: 63%

A direct comparison between gas state and atomised liquid state precursor in the deposition of functional coatings by pin corona plasma

Herbert¹,

Jaroszyńska-Wolińska

2011

Eur. Phys. J. Appl. Phys.

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An atmospheric pressure non-thermal equilibrium pin corona plasma jet was used to deposit polymeric coatings from monomer precursor in both vapour and liquid aerosol states to allow a direct comparison of the quality and performance of the as-deposited coatings, specifically with respect to the achievement of soft plasma polymerisation (SPP) where the coating exhibits minimal fragmentation or damage to the monomer molecule while, at the same time, being highly cross-linked. A long chain perfluorocarbon molecule was introduced into the helium plasma and coatings deposited at rates of up to 50 nm/min. XPS, FTIR, contact angle and ellipsometric measurements indicated that a controlled polymerization reaction had taken place in the case of the vapour deposited samples through the vinyl group of the monomer, with only minor fragmentation of the functional perfluoro chain. Furthermore, a high level of cross-linking was achieved and the coatings were stable to a toluene wash. In contrast, while the liquid deposition samples showed good retention of monomer molecular structure, they exhibited negligible cross-linking and were readily removed by immersion in toluene rendering them functionally useless.

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Cover Picture: Plasma Process. Polym. 2/2007

Cited by 28 publications

References 0 publications

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Hydrophobic coatings deposited with an atmospheric pressure microplasma jet

A direct comparison between gas state and atomised liquid state precursor in the deposition of functional coatings by pin corona plasma

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