CrN Sputtered Thin Films for Supercapacitor Applications

Abstract

The growing demand of energy storage device has attracted significant attention toward transition metal nitrides because of their remarkable mechanical, electronic, and catalytic applications. Here, sputtered chromium nitride thin films deposited on steel substrate have been used as a working electrode for supercapacitor application. The deposited columnar CrN thin films show (111) and (200) planes of cubic phase. The electrochemical properties of CrN working electrode exhibit high specific capacitance of 41.8 F/g at the scan rate of 5 mV/s with excellent capacitance retention up to 2000 cycles. The supercapacitive performance of the CrN films suggests the potential application for supercapacitors.