Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture

Abstract

Cobalt nickel oxide films are deposited on Si(111) or fluorine-doped tin-oxide-coated (FTO) glass substrates employing a pulsed hollow-cathode discharge. The hollow cathode is operated with argon gas flowing through the nozzle and with O2 gas admitted to the vacuum chamber. Three different cathode compositions (Co20Ni80, Co50Ni50, and Co80Ni20) are investigated. Deposited and annealed thin films are characterized by X-ray diffraction, infrared (Raman) spectroscopy, and ellipsometry. As-deposited films consist of a single mixed cobalt nickel oxide phase. Upon annealing at 600 °C, the mixed cobalt nickel oxide phase separates into two cystalline sub-phases which consist of cubic NiO and cubic Co3O4. Annealed films are investigated by spectroscopic ellipsometry and the optical bandgaps are determined.