Crystallization kinetics of amorphous Cr2AlC thin films

Abdulkadhim, Ahmed; Baben, Moritz to; Takahashi, Tetsuya; Schnabel, Volker; Hans, Marcus; Polzer, Conrad; Polcik, P.; Schneider, Jochen M.

doi:10.1016/j.surfcoat.2011.06.003

Cited by 86 publications

(99 citation statements)

References 45 publications

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“…In previous papers [11,12] it has been argued that proper identification of Cr 2 AlC must consider also the presence of the (0002) reflections (at around 13.8° in 2θ). There are however some authors claiming the existence of Cr 2 AlC phase without the occurrence of (0002) peak (hkil Bragg-Bravais notations) [8,18,20,21,29]. With that said, we have however identified unambiguously both the (0002) and (0004) peaks in the all-crystalline sample, as analyzed hereafter.…”

Section: X-ray Diffraction Patternsmentioning

confidence: 52%

“…Recent reports on crystallization kinetics of amorphous Cr 2 AlC [29] show that annealing at intermediate temperatures (between 560 and 610 ℃ ) promotes formation of a metastable phase (Cr,Al) 2 C x , distorted hexagonal, space group P63/mmc. A recent report by Berger et al [10] confirmed that an XRD peak appearing at 40.6° in 2θ may belong to the (002) reflection of the (Cr,Al) 2 C x distorted hexagonal phase, therefore confirming our assumption.…”

Section: X-ray Diffraction Patternsmentioning

confidence: 99%

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Incipient low-temperature formation of MAX phase in Cr–Al–C films

Crisan

2018

J Adv Ceram

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Ceramic-metallic MAX phase of chromium aluminium carbide ternary compounds was successfully obtained through deposition by DC sputtering onto Si substrates. A study of the influence of substrate temperature and in-air post-annealing on the film crystallinity and oxidation was undertaken. Scanning electron microscopy (SEM), wavelength-dispersive X-ray analysis (WDSX), and X-ray diffraction (XRD) were used for film characterization. It is shown that, at substrate temperature of about 450 ℃, as-deposited films are amorphous with small nanocrystals. Subsequent annealing in air at 700 ℃ leads to film crystallization and partial oxidation. WDSX spectroscopy shows that the films oxidise to a depth of around 120 nm, or 5% of total film thickness which amounts at around 2.68 µm. As a novelty, this demonstrates the possibility of in-air crystallization of Cr 2 AlC films without significant oxidation. Materials Analysis Using Diffraction (MAUD) software package for a full-profile analysis of the XRD patterns (Rietveld-type) was used to determine that, as a result of annealing, the average crystallite size changes from 7 to 34 nm, while microstrain decreases from 0.79% to 0.24%. A slight tendency of preferential growth along the (10 10) direction has been observed. Such texturing of the microstructure has the potential of inducing beneficial anisotropic fracture behaviour in the coatings, potentially interesting for several industrial applications in load-bearing devices.

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Section: X-ray Diffraction Patternsmentioning

confidence: 52%

Section: X-ray Diffraction Patternsmentioning

confidence: 99%

Incipient low-temperature formation of MAX phase in Cr–Al–C films

Crisan

2018

J Adv Ceram

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“…They are nanolamellas with M n+1 AX n (n is 1, 2, or 3) chemical formula, where M is an early transition metal, A is an A-group element from the periodic table and X is either carbon or nitrogen [1]. These compounds are known for their low density [1], high stiffness [2,3], superior thermal shock resistance [1,4], damage tolerance [5,6], self-healing behavior [7,8], significant electrical conductivity [4,9], and erosion [10], oxidation [11][12][13][14][15][16] and hot corrosion resistance [6,17]. Moreover, M n+1 AX n phases have been identified as promising candidates for hydrogen storage applications [18] along with other materials [19,20].…”

Section: Introductionmentioning

confidence: 99%

Sputtering Power Effects on Growth and Mechanical Properties of Cr2AlC MAX Phase Coatings

Naveed

Obrosov

Żak

et al. 2016

Metals

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Abstract:Coating growth and mechanical properties of nanolamellar Cr 2 AlC coatings at various sputtering power were investigated in the present study. Cr 2 AlC coating was deposited on the IN 718 superalloy and (100) Si wafers by DC magnetron sputtering at different sputtering powers. The structure and properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and nanoindentation. It was found that coatings had columnar structure with nanocrystalline substructure. Deposition rate increased with the sputtering power. XRD results showed the presence of the Cr 2 AlC MAX phase, intermetallic AlCr 2 and Cr 7 C 3 carbide phases, along with the change in preferential coating growth orientation. TEM observations confirmed the occurrence of these phases, and the SAED patterns demonstrated significant texture of the coatings. Hardness values were measured in the range between 11-14 GPa, showing a slight increase with the sputtering power.

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“…Numerous other MAX phase materials have been deposited using magnetron sputtering [7][8][9][10][11][12][13][14] including Cr 2 AlC [15][16][17][18][19][20][21][22][23].…”

Section: Introductionmentioning

confidence: 99%

A combinatorial comparison of DC and high power impulse magnetron sputtered Cr2AlC

Field

Carlsson

Eklund

et al. 2014

Surface and Coatings Technology

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Abstract. Using a combinatorial approach, Cr, Al and C have been deposited onto sapphire wafer substrates by High Power Impulse Magnetron Sputtering (HiPIMS) and DC magnetron sputtering. X-ray photoelectron spectroscopy, X-ray absorption spectroscopy and X-ray diffraction were employed to determine the composition and microstructure of the coatings and confirm the presence of the Cr 2 AlC MAX phase within both coatings. One location in both the DCMS and HiPIMS coatings contained only MAX phase Cr 2 AlC.The electrical resistivity was also found to be nearly identical at this location and close to that reported from the bulk, indicating that the additional energy in the HiPIMS plasma was not required to form high quality MAX phase Cr 2 AlC.

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Crystallization kinetics of amorphous Cr2AlC thin films

Cited by 86 publications

References 45 publications

Incipient low-temperature formation of MAX phase in Cr–Al–C films

Incipient low-temperature formation of MAX phase in Cr–Al–C films

Sputtering Power Effects on Growth and Mechanical Properties of Cr2AlC MAX Phase Coatings

A combinatorial comparison of DC and high power impulse magnetron sputtered Cr2AlC

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