2019
DOI: 10.1007/s10854-019-01942-5
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Cu-doped nickel oxide hole transporting layer via efficient low-temperature spraying combustion method for perovskite solar cells

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Cited by 13 publications
(6 citation statements)
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“…The surface morphologies and root-mean-square (RMS) surface roughness of NiO x HTLs are vital for PSCs. As shown in Figure 4a,b, both films show a continuous, uniform, and crack-free surface, 47 with the substrates completely covered by the compacted NiO x (Cu:NiO x ) nanoparticles, which prevents the current leakage from perovskite layers. As shown in Figure 4a and the inset image, the surface morphology of the NiO x film deposited on FTO substrate is similar to that of the bare FTO surface.…”
Section: Resultsmentioning
confidence: 98%
“…The surface morphologies and root-mean-square (RMS) surface roughness of NiO x HTLs are vital for PSCs. As shown in Figure 4a,b, both films show a continuous, uniform, and crack-free surface, 47 with the substrates completely covered by the compacted NiO x (Cu:NiO x ) nanoparticles, which prevents the current leakage from perovskite layers. As shown in Figure 4a and the inset image, the surface morphology of the NiO x film deposited on FTO substrate is similar to that of the bare FTO surface.…”
Section: Resultsmentioning
confidence: 98%
“…Therefore, doping is not always conducive to hole extraction at the interface of NiO x and perovskite. Film surface modification [28][29][30][31] or various advanced film deposition methods [32][33][34][35][36] can be used to relieve charge recombination at charge transfer layer (CTL)/perovskite interface.…”
Section: Introductionmentioning
confidence: 99%
“…Christians et al 40 initially introduced copper iodide (CuI) as an inorganic p-type HTM, and the corresponding device showed stable current output. Qin et al 41 fabricated a highefficient device using cuprous thiocyanate (CuSCN) as an efficient inorganic HTM. Nickel oxide (NiO), as an inorganic p-type semiconductor, had also been widely employed in PSCs.…”
Section: Introductionmentioning
confidence: 99%