2009
DOI: 10.1109/led.2009.2021079
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Demonstration of Tunneling FETs Based on Highly Scalable Vertical Silicon Nanowires

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Cited by 191 publications
(88 citation statements)
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“…However, the low ON-state current in Si TFETs, due to poor band-to-band tunneling efficiency, is a major challenge to be overcome. This problem is being extensively studied using strain, hetero-structures, low bandgap materials, high-k gate insulators and nanowires [6,[11][12][13][14]. The other problem with the TFET is that in aggressively scaled devices, random variability in transistor performance due to random dopant fluctuations (RDF) can become significant [15].…”
Section: Introductionmentioning
confidence: 99%
“…However, the low ON-state current in Si TFETs, due to poor band-to-band tunneling efficiency, is a major challenge to be overcome. This problem is being extensively studied using strain, hetero-structures, low bandgap materials, high-k gate insulators and nanowires [6,[11][12][13][14]. The other problem with the TFET is that in aggressively scaled devices, random variability in transistor performance due to random dopant fluctuations (RDF) can become significant [15].…”
Section: Introductionmentioning
confidence: 99%
“…Vertical channel TFETs are relatively easy to fabricate. Vertical nanowires with a cylindrical shape can be grown with a metal nanoparticle as a catalyst [18], or etched (and oxidized) using a patterned mask [19][20][21]. The vertical nanowires can be turned into nanowire TFETs by forming the drain, gate electrode, and source.…”
Section: Cylindrical Nanowire Channelmentioning
confidence: 99%
“…One of such devices is the TFET [22][23][24][25][26][27][28]. Unlike the MOSFET, which utilizes thermionic injection of carriers, TFET uses tunneling as the carrier injection mechanism.…”
Section: Drainmentioning
confidence: 99%