Determination of hafnium in zirconium oxide using inductively coupled plasma emission spectrometry

Baluch, N. Z.; Anwar, Khurshid; Ifzal, S.M.; Mohammad, Din

doi:10.1007/bf02035808

Cited by 4 publications

(1 citation statement)

References 8 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Various techniques such as neutron activation analysis (NAA), , isotopic dilution spark source mass spectrometry (ID SS MS), spectrophotometry, , emission spectrography, , spectrofluorimetry assisted by chemometric methods, inductively coupled plasma atomic emission spectrometry (ICP-AES), and X-ray fluorescence spectrometry (XRF) − have been used for determination of impurities of Hf in zirconium matrix. Generally, many of them suffer due to matrix interferences and some of them are not suitable for determination of microamounts of hafnium in zirconium.…”

mentioning

confidence: 99%

Determination of Microamounts of Hafnium in Zirconium Using Inductively Coupled Plasma Atomic Emission Spectrometry and Inductively Coupled Plasma Mass Spectrometry during Their Separation by Ion Exchange on Diphonix Chelating Resin

Smolik

Jakóbik‐Kolon

2009

Anal. Chem.

View full text Add to dashboard Cite

Inductively coupled plasma atomic emission spectrometry (ICP-AES) and inductively coupled plasma mass spectrometry (ICPMS) methods were applied to check the possibility of determination of hafnium in zirconium at a level lower than 100 ppm. A zirconium matrix of hafnium content lower than 10 ppm was obtained using a worked-out separation method exploiting ion exchange on Diphonix resin. Both methods give results in good agreement with each other as well as with those for certified reference material BCR-098 (Zircaloy-4). They were utilized in determination of Hf in the samples collected during separation of microamounts of hafnium from zirconium by the mentioned ion exchange. These results proved the earlier described method of separation on Diphonix resin to be effective even when the initial concentration of hafnium in zirconium decreases from 2.4% to 0.0082%.

show abstract