2019
DOI: 10.1016/j.apsusc.2019.05.089
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Development of phosphor containing functional coatings via cold atmospheric pressure plasma jet - Study of various operating parameters

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Cited by 11 publications
(10 citation statements)
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“…Materials in a gaseous state at room temperature are themselves applied as precursors, whereas materials that exist as liquids are mainly introduced to a plasma region as an aerosol via atomizing or bubbling with gas. GATP methods are commonly used for the deposition of polymer films [ 51 , 52 , 53 , 54 , 55 , 56 , 57 , 58 , 59 , 60 , 61 , 62 , 63 , 64 , 65 , 66 , 67 , 68 , 69 , 70 , 71 , 72 , 73 , 74 , 75 , 76 , 77 , 78 , 79 , 80 , 81 , 82 , 83 , 84 , 85 ], as this method allows in-line processing by moving either the APP devices or the substrates [ 39 ].…”
Section: Synthesis Methods Using Gas/aerosol-type Precursors (Gatp)mentioning
confidence: 99%
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“…Materials in a gaseous state at room temperature are themselves applied as precursors, whereas materials that exist as liquids are mainly introduced to a plasma region as an aerosol via atomizing or bubbling with gas. GATP methods are commonly used for the deposition of polymer films [ 51 , 52 , 53 , 54 , 55 , 56 , 57 , 58 , 59 , 60 , 61 , 62 , 63 , 64 , 65 , 66 , 67 , 68 , 69 , 70 , 71 , 72 , 73 , 74 , 75 , 76 , 77 , 78 , 79 , 80 , 81 , 82 , 83 , 84 , 85 ], as this method allows in-line processing by moving either the APP devices or the substrates [ 39 ].…”
Section: Synthesis Methods Using Gas/aerosol-type Precursors (Gatp)mentioning
confidence: 99%
“…Zhang et al [ 51 ], Ricci Castro et al [ 52 ], Van Vrekhem et al [ 53 ], and Pandiyaraj et al [ 54 ] reported an APPJ with pin–ring electrodes. The pin electrode and the ring electrode are used as high-voltage (HV) and ground electrodes, respectively.…”
Section: Synthesis Methods Using Gas/aerosol-type Precursors (Gatp)mentioning
confidence: 99%
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“…Polipropilen üzerinde yapılmış ABSP uygulamalarında, polioksimetilen malzemesinde görülen sonuçlara benzer olarak, su temas açılarında düşüş, yüzey serbest enerjisinde artış görülmüştür. Artan plazma işlemi süresi [8,[23][24][25], plazma gücü [26,27], gaz debisi [23,26], proses gazının [23] ve gaz karışım oranı [3] ile elde edilen yüzey serbest enerjisi artışı arasında ilişkiler bulunmuştur. Bu etkiler; yüzeydeki atomların birbirlerine oranı, oluşan bağların çeşitleri, su temas açıları, nem tutma özelliği, yüzey pürüzlülüğü gibi çeşitli yüzey özelliklerinde oluşan değişikliklerdir.…”
Section: Giriş (Introduction)unclassified