In this study, ultrathin
calcium-silicate-hydrate (C-S-H) phases
on silicon wafers were prepared, which are partially terminated by
calcium carbonates. First, a density functional theory (DFT) analysis
was performed, to define the nature of the carbonates that are stable
in the structure, concluding that two different kinds of them will
be present on the surface. Then, by means of four different experimental
handling techniques, the C-S-H phases were activated by disposing
the carbonate termination: (1) UV-light (365 nm) radiation as a function
of time, (2) direct heating between room temperature (RT) and 840
°C, (3) wet chemical treatment by an aqueous solution with a
defined pH value as a function of time and (4) Ar/O2-plasma
treatment. Fourier transform infrared (FTIR) spectroscopy was implemented
to confirm that every method successfully reduced the carbonate termination
of the ultrathin C-S-H phases. Interestingly, the effects of the diverse
treatments on the C-S-H phases are very different. UV-light radiation
eliminates partially carbonates from the C-S-H phases; but in contrast
to the other treatments, the rate of this activation is very low.
Temperatures up to 700 °C are necessary to remove the carbonates
by direct heating. Remarkably, at these high temperatures, the remaining
calcium-silicate (C-S) phases start to change their crystal structure,
which was proved by means of X-ray diffraction (XRD). During wet chemical
treatment, in addition to the carbonates removal, C-S-H phases were
also affected, due to the low pH value (≤4) of the implemented
solution. Finally, the most rapid activation at RT was provided by
Ar/O2-plasma treatment, without drastic impacts on the
C-S-H phases.