2003
DOI: 10.1063/1.1576909
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Diamond-like carbon nanocomposite films

Abstract: Diamond-like carbon (DLC) nanocomposite films were deposited at room temperature by inductively coupled plasma chemical vapor deposition using hexamethyldisilane (HMDS), hexamethyldisilazane (HMDSN), and hexamethyldisiloxane (HMDSO) precursors. High-resolution transmission electron microscopy showed that all the films contained nanoparticles. The DLC nanocomposite films deposited by HMDS contained hollow spherical nanocrystallites, called nanoballs, of hexagonal silicon carbide. The nanocomposite films deposit… Show more

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Cited by 70 publications
(26 citation statements)
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“…The carbon-based coatings characterized by high hardness, low internal stress, good toughness, and low tribological moisture sensitivity are of continuously increased significance in the engineering applications [1][2][3][4][5][6]. Unfortunately, successful applications of carbon-based coatings have been considerably restricted by the high internal stress and poor adhesion to some substrates, especially, they could increase friction coefficient and quickly fail in high humid or aqueous environments [7][8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 98%
“…The carbon-based coatings characterized by high hardness, low internal stress, good toughness, and low tribological moisture sensitivity are of continuously increased significance in the engineering applications [1][2][3][4][5][6]. Unfortunately, successful applications of carbon-based coatings have been considerably restricted by the high internal stress and poor adhesion to some substrates, especially, they could increase friction coefficient and quickly fail in high humid or aqueous environments [7][8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 98%
“…DLC films have been caught more attention owing to their industrial applications such as excellent mechanical and tribological performance [4][5][6]. However, the true DLC films are very hard with high internal stresses, which tend to be brittle, have poor adhesion, and become unsuitable for highly loaded applications.…”
Section: Introductionmentioning
confidence: 99%
“…The molecular formula of HMDSO gas precursor is (CH 3 ) 3 -Si-O-Si-(CH 3 ) 3 . 10,18 This precursor is a organosilicon compound prepared by the hydrolysis of trimethylsilyl chloride. Initially, we have used standard cleaning process to clean the substrates (pyrex glass slides).…”
Section: Methodsmentioning
confidence: 99%