2014
DOI: 10.5796/electrochemistry.82.1052
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Dimethoxydiphenylsilane (DDS) as an Electrolyte Additive for High Voltage Li-ion Batteries

Abstract: The performance of the Li/LiNi 0.5 Mn 1.5 O 4 cells cycled to 5.0 V (vs. Li/Li + ) using 1.0 M LiPF 6 -EC/DMC (1/1, v/v) with and without dimethoxydiphenylsilane (DDS) at 25°C has been investigated. Cells with 1% DDS added deliver slightly lower initial discharge capacity than the cells with baseline electrolyte, 115.3 vs. 120.9 mAh g −1 . Electrochemical methods and ex-situ analytical techniques, including TGA and SEM, are employed to conduct the interfacial chemistry of LiNi 0.5 Mn 1.5 O 4 /electrolyte to be… Show more

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Cited by 4 publications
(1 citation statement)
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“…63 The P-O additives include tris(trimethylsilyl)phosphate, 64 tris(trimethylsilyl)phosphite, 11 dimethyl phenylphosphonite, 65 triethyl phosphite, 66 diethyl (thiophen-2-ylmethyl) phosphonate, 67 lithium difluorobis(oxalato) phosphate, 68 and LiPO 2 F 2. 69 The Si-O containing additives include dimethoxydiphenylsilane, 70 and those included in B-O and P-O containing electrolyte additives. F, Si and phenyl groups are beneficial to the robustness of the cathode interphase films because of their chemical and structural stability, such as tris (pentafluorophenyl) phosphine, 71,72 4-(trifluoromethyl)-Benzonitrile, 73 phenyl trifluoromethyl sulfide, 74 ethylene glycol bis (propionitrile) ether, 75 trimethylsilylcyclopentadiene, 76 diethyl Phenylphosphonite, 77 and N-Allyl-N,N-Bis(trimethylsilyl)amine.…”
Section: Elimination Of Transition Metal Ion Dissolution or Depositionmentioning
confidence: 99%
“…63 The P-O additives include tris(trimethylsilyl)phosphate, 64 tris(trimethylsilyl)phosphite, 11 dimethyl phenylphosphonite, 65 triethyl phosphite, 66 diethyl (thiophen-2-ylmethyl) phosphonate, 67 lithium difluorobis(oxalato) phosphate, 68 and LiPO 2 F 2. 69 The Si-O containing additives include dimethoxydiphenylsilane, 70 and those included in B-O and P-O containing electrolyte additives. F, Si and phenyl groups are beneficial to the robustness of the cathode interphase films because of their chemical and structural stability, such as tris (pentafluorophenyl) phosphine, 71,72 4-(trifluoromethyl)-Benzonitrile, 73 phenyl trifluoromethyl sulfide, 74 ethylene glycol bis (propionitrile) ether, 75 trimethylsilylcyclopentadiene, 76 diethyl Phenylphosphonite, 77 and N-Allyl-N,N-Bis(trimethylsilyl)amine.…”
Section: Elimination Of Transition Metal Ion Dissolution or Depositionmentioning
confidence: 99%