2014
DOI: 10.1149/2.0471410jes
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Direct Electroless Plating of Iron-Boron on Copper

Abstract: Direct electroless deposition, i.e., without using a sacrificial anode or substrate activation, of iron-boron (FeB) films on copper substrates is reported. Electroanalytical techniques including polarization measurements of oxidation and reduction half-reactions are employed to optimize process parameters, thereby enabling direct nucleation and sustained growth of electroless FeB films on copper. Scanning electron microscopy, X-ray photoelectron spectroscopy and X-ray diffraction are used to characterize the f… Show more

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Cited by 12 publications
(5 citation statements)
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“…[31] Even non-noble metals such as Al can be deposited under extreme conditions (absence of water and air, aggressive inorganic reducer LiAlH 4 ), [58,59] but the aforementioned criteria result in electroless plating mostly being limited to the late transition metals. With standard reduction potentials between À 0.25 V and À 0.44 V, [62] Fe, [63] Co, [64,65] and especially Ni [14,18,27,66,67] can be named as the least noble but still regularly plated metals. Protocols are also available for Pd, [37,68] Pt [13,69] and the coinage metals Cu, [70,71] Ag [35,[51][52][53][54][55][56] and Au.…”
Section: Metal Complexmentioning
confidence: 99%
“…[31] Even non-noble metals such as Al can be deposited under extreme conditions (absence of water and air, aggressive inorganic reducer LiAlH 4 ), [58,59] but the aforementioned criteria result in electroless plating mostly being limited to the late transition metals. With standard reduction potentials between À 0.25 V and À 0.44 V, [62] Fe, [63] Co, [64,65] and especially Ni [14,18,27,66,67] can be named as the least noble but still regularly plated metals. Protocols are also available for Pd, [37,68] Pt [13,69] and the coinage metals Cu, [70,71] Ag [35,[51][52][53][54][55][56] and Au.…”
Section: Metal Complexmentioning
confidence: 99%
“…Galvanic coupling can be avoided in some cases by simple substrate surface treatment or alteration of the EL bath composition. Akolkar and co-workers 257 successfully plated EL Fe onto a Cu substrate at pH 10−13 by increasing the [BH 4 − ] in an Fe II -Rochelle salt bath to prepare hard, corrosion resistant, solderable coatings. Rohan et al 258 added Ni II salts to an EL Fe bath formulated at pH 6.5 with citric acid and CH 3 CH(OH)COOH ligands and the strong reductant, DMAB, to deposit EL permalloy (i.e., NiFe alloy) films having oriented magnetic dipoles onto a Cu-coated Si substrate at temperatures exceeding 58 °C in the presence of a magnetic field.…”
Section: ■ Elementsmentioning
confidence: 99%
“…Galvanic coupling can be avoided in some cases by simple substrate surface treatment or alteration of the EL bath composition. Akolkar and co-workers successfully plated EL Fe onto a Cu substrate at pH 10–13 by increasing the [BH 4 – ] in an Fe II -Rochelle salt bath to prepare hard, corrosion resistant, solderable coatings. Rohan et al .…”
Section: Elementsmentioning
confidence: 99%
“…However, the existence of salt and dissolved oxygen in seawater enhances the electrochemical corrosion of copper. To prevent the accident occurring, researchers used many methods, such as corrosion inhibitors (Forslund et al , 2013; Hosseinpour et al , 2013; Liu et al , 2015), self-assembly membrane technology (Liu et al , 2018), coatings (Parker and Holt, 2014) and surface passivation (Blickensderfer et al , 2014). Self-assembly membrane technology can form ordered molecular membrane on copper surface, and then metal substrates can be effectively protected.…”
Section: Introductionmentioning
confidence: 99%