Direct Optical Patterning of Quantum Dots: One Strategy Different Chemical Processes

Abstract

Patterning, stability, and dispersion of the semiconductor quantum dots (scQDs) are the three issues strictly interconnected for successful device manufacturing. Recently several authors adopted direct optical patterning (DOP) as a step forward in photolithography to position the scQDs in a selected area. However, the chemistry behind the stability, dispersion, and patterning has to be carefully integrated to obtain a functional and therefore, commercial device. In this review are described different chemical strategies suitable to stabilize the scQDs both at a single level and as an ensemble with a special focus on the ones compatible with direct optical patterning (DOP). With the same purpose, the scQDs dispersion in a matrix was described in terms of the scQDs surface ligands interactions with the matrix itself. The chemical processes behind the DOP are illustrated and discussed for five different approaches that consider together stability, dispersion, and the patterning itself of the scQDs.