Discharge characteristics of SF₆/C₂H₆working mixture in electric-initiated pulsed HF laser

Discharge initiated high power repetitively pulsed HF/DF laser

“…The system structure and experimental procedures are generally identical to those of our previous works [5][6][7] , so that only some relevant points will be touched below. The transverse excitation electric discharge structure with UV pre-ionization is designed to create suitable conditions for forming the glow discharge.…”

“…SF 6 is commonly used as F-atom donor to achieve the higher laser energy and electrical efficiency. The using of SF 6 -based gas mixtures, such as SF 6 with ethane (or deuterated ethane for DF laser), can eliminate the risk of explosion that may happened in chain reaction system and with gas pre-mixed, the system size minimized considerably. However, strong electron attachment of SF 6 makes it difficult to maintain uniform and stable glow discharge in gas mixtures.…”