Discharge Systems and Plasma-Assisted Electron Emission in Forevacuum Pressure Range

Бурдовицин, В. А.; Окс, Е. М.

doi:10.1007/s11182-021-02221-9

Cited by 3 publications

(4 citation statements)

References 12 publications

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“…Maximum e-beam currents − up to several amperes and above − can be achieved using the socalled e-guns with "plasma cathodes", which are based on the extracting an e-beam from a plasma generated either in a hollow cathode discharge [69][70][71][72] or in a surface discharge near the ferroelectric surface [73][74][75][76][77][78][79][80][81] without thermionic cathodes and other heated parts.…”

Section: Electron Guns With Plasma Cahodesmentioning

confidence: 99%

“…The main advantage of all e-guns with a plasma cathode is their ability to operate at a fore pump gas (air or argon) pressure range of (~10 -2 − 10 -1 Тоrr). These e-guns, without any high-temperature parts, have a long service life and can generate stable e-beams with a maximum cw-and peak ecurrents of 400 mA and 150 A, respectively [70,72]. These unique properties of the e-guns with plasma cathode ensure their promising applications in various fields of plasma technologies, electron-beam melting, laser pumping etc.…”

Section: E-source With a Hollow Cathodementioning

confidence: 99%

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Electron-Beam Pumped UVC-Emitters Based on (Al, Ga)N Material System

Jmerik¹,

Kozlovsky²,

Wang³

2023

Preprint

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Powerful emitters of the ultraviolet C (UVC) light in the wavelength range of 230-280nm are necessary for the development of effective and safe optical disinfection technologies, high-sensitive optical spectroscopy and non-line-of-sight optical communication. This review considers such UVC-emitters with electron-beam pumping of heterostructures with quantum wells in the (Al,Ga)N material system. The important advantages of these emitters include the absence of the critical problem of p-type doping and the possibility of achieving record (up to several tens of watts for peak values) output optical power values in the UVC range. The review consistently considers about a decade of world experience in the implementation of various UV emitters with various types of thermionic, field-emission, and plasma-cathode electron guns (sources) used to excite various designs of active (light-emitting) regions in heterostructures with quantum wells AlxGa1-xN/AlyGa1-yN (x = 0 − 0.5, y = 0.6 − 1) fabricated either by metal-organic chemical vapor deposition or by plasma-activated molecular beam epitaxy. Special attention is paid to the production of heterostructures with multiple quantum wells/two-dimensional(2D) quantum disks GaN/AlN with a monolayer (1ML ~ 0.25nm) thickness, which ensures a high internal quantum efficiency of radiative recombination in the UVC range, low elastic stresses in heterostructures, and a high output UVC-optical powers.

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Section: Electron Guns With Plasma Cahodesmentioning

confidence: 99%

Section: E-source With a Hollow Cathodementioning

confidence: 99%

Electron-Beam Pumped UVC-Emitters Based on (Al, Ga)N Material System

Jmerik¹,

Kozlovsky²,

Wang³

2023

Preprint

View full text Add to dashboard Cite

show abstract

“…The maximum e-beam currents-up to several amperes and above-can be achieved using so-called e-guns with "plasma cathodes", based on the extraction of the e-beam from the plasma generated either in a hollow cathode discharge [72][73][74][75] or in a surface…”

Section: Electron Guns With Plasma Cahodesmentioning

confidence: 99%

“…The maximum e-beam currents—up to several amperes and above—can be achieved using so-called e-guns with “plasma cathodes”, based on the extraction of the e-beam from the plasma generated either in a hollow cathode discharge [ 72 , 73 , 74 , 75 ] or in a surface discharge near the ferroelectric surface [ 76 , 77 , 78 , 79 , 80 , 81 , 82 , 83 , 84 , 85 , 86 ]. Both e-guns with hollow and ferroelectric cathodes do not have thermionic cathodes or other heated parts.…”

Section: The Main Types Of Electron Guns Used To Excite Uvc Radiationmentioning

confidence: 99%

Electron-Beam-Pumped UVC Emitters Based on an (Al,Ga)N Material System

2023

View full text Add to dashboard Cite

Powerful emitters of ultraviolet C (UVC) light in the wavelength range of 230–280 nm are necessary for the development of effective and safe optical disinfection technologies, highly sensitive optical spectroscopy and non-line-of-sight optical communication. This review considers UVC emitters with electron-beam pumping of heterostructures with quantum wells in an (Al,Ga)N material system. The important advantages of these emitters are the absence of the critical problem of p-type doping and the possibility of achieving record (up to several tens of watts for peak values) output optical power values in the UVC range. The review consistently considers about a decade of world experience in the implementation of various UV emitters with various types of thermionic, field-emission, and plasma-cathode electron guns (sources) used to excite various designs of active (light-emitting) regions in heterostructures with quantum wells of AlxGa1−xN/AlyGa1−yN (x = 0–0.5, y = 0.6–1), fabricated either by metal-organic chemical vapor deposition or by plasma-activated molecular beam epitaxy. Special attention is paid to the production of heterostructures with multiple quantum wells/two-dimensional (2D) quantum disks of GaN/AlN with a monolayer’s (1 ML~0.25 nm) thickness, which ensures a high internal quantum efficiency of radiative recombination in the UVC range, low elastic stresses in heterostructures, and high-output UVC-optical powers.

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