2022 IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON) 2022
DOI: 10.1109/edkcon56221.2022.10032940
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Doping induced threshold voltage and ION/IOFF ratio modulation in surrounding gate MOSFET for analog applications

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Cited by 16 publications
(11 citation statements)
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“…The lateral graded doping in channel improves the transconductance and decreases the drain conductance [37]. It is worth noticing that highest sensitivity is obtained in case of forward graded doping when N Ch1 = 10 10 /cm 3 , N Ch2 = 10 14 /cm 3 , and N Ch3 = 10 18 /cm 3 .…”
Section: Physical Structure and Specificationsmentioning
confidence: 97%
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“…The lateral graded doping in channel improves the transconductance and decreases the drain conductance [37]. It is worth noticing that highest sensitivity is obtained in case of forward graded doping when N Ch1 = 10 10 /cm 3 , N Ch2 = 10 14 /cm 3 , and N Ch3 = 10 18 /cm 3 .…”
Section: Physical Structure and Specificationsmentioning
confidence: 97%
“…In the modern era of digitalization, field-effect transistor (FET) has emerged as a multi-functional device which has numerous applications in multifarious fields [1][2][3][4]. Different devices [5][6][7][8][9][10][11] and sensors [12,13] have been investigated (along with the fabrication techniques [14]) with the continuous progress in science and technology.…”
Section: Introductionmentioning
confidence: 99%
“…28 Additionally, the outcome of temperature has also been studied on linearity and distortion FOMs. The linearity and distortion FOMs are estimated as per Equations (9)(10)(11)(12)(13)(14)(15)(16) and designed in relation of gate voltage.…”
Section: Impact Of Temperaturementioning
confidence: 99%
“…To overcome this problem the researchers have proposed many fabrication techniques discussed in the fabrication part. Various design engineering techniques are also performed to overcome this drawback in NWFET 12–15 …”
Section: Introductionmentioning
confidence: 99%
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