“…In analogy to “conventional” magnetron sputtering, magnetron-based GAS systems were initially employed generally for the production of various metallic (e.g., Ag [69,70,71], Cu [72,73], Al [74], Ti [75,76,77], Co [78,79], Pt [80,81], Nb [82], Pd [83], W [84], Ni [85], Ru [86]) and metal-oxide NPs [87,88]. However, our group recently showed that GAS systems may also be easily adapted for the production of plasma polymer NPs if the polymeric target is sputtered in the RF mode [89,90,91,92,93].…”