Double-side exposure UV-LED CNC lithography for fine 3D microfabrication

Kim, Jungkwun; Yoon, Yong-Kyu; Allen, Mark G.

doi:10.1109/nems.2017.8017065

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Double-side exposure UV-LED CNC lithography for fine 3D microfabrication

Cited by 3 publications

References 12 publications

Experimental and Modeling Based Investigations of Process Parameters on a Novel, 3D Printed and Self-Insulated 24-Well, High-Throughput 3D Microelectrode Array Device for Biological Applications

Experimental and Modeling Based Investigations of Process Parameters on a Novel, 3D Printed and Self-Insulated 24-Well, High-Throughput 3D Microelectrode Array Device for Biological Applications

Investigation of the Effect of Printing Angle and Device Orientation on Micro-Stereolithographically Printed, and Self-insulated, 24-well, High-Throughput 3D Microelectrode Arrays

UV-LED Lithography for Millimeter-Tall High-Aspect Ratio 3d Structures

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