Downstream plasma transport and metal ionization in a high-powered pulsed-plasma magnetron

Li, Meng; He, Yu; Szott, Matthew; McLain, Jake; Ruzic, D. N.

doi:10.1063/1.4878622

Cited by 23 publications

(16 citation statements)

References 42 publications

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“…Several authors studied the temporal fluctuations in the floating potential and some associated it with the moving ionization zones. 8,[33][34][35][36][37] Such measurements are relatively simple but offer a little insight into the properties of plasma since the motion of charged particles is affected by the gradient of the plasma potential and not by the gradient of the floating potential.…”

Section: Introductionmentioning

confidence: 99%

Plasma potential of a moving ionization zone in DC magnetron sputtering

Panjan

Anders

2017

Journal of Applied Physics

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Using movable emissive and floating probes, we determined the plasma and floating potentials of an ionization zone (spoke) in a direct current magnetron sputtering discharge. Measurements were recorded in a space and time resolved manner, which allowed us to make a three-dimensional representation of the plasma potential. From this information we could derive the related electric field, space charge, and the related spatial distribution of electron heating. The data reveal the existence of strong electric fields parallel and perpendicular to the target surface. The largest E-fields result from a double layer structure at the leading edge of the ionization zone. We suggest that the double layer plays a crucial role in the energization of electrons since electrons can gain several 10 eV of energy when crossing the double layer. We find sustained coupling between the potential structure, electron heating, and excitation and ionization processes as electrons drift over the magnetron target. The brightest region of an ionization zone is present right after the potential jump, where drifting electrons arrive and where most local electron heating occurs. The ionization zone intensity decays as electrons continue to drift in the Ez × B direction, losing energy by inelastic collisions; electrons become energized again as they cross the potential jump. This results in the elongated, arrowhead-like shape of the ionization zone. The ionization zone moves in the –Ez × B direction from which the to-be-heated electrons arrive and into which the heating region expands; the zone motion is dictated by the force of the local electric field on the ions at the leading edge of the ionization zone. We hypothesize that electron heating caused by the potential jump and physical processes associated with the double layer also apply to magnetrons at higher discharge power, including high power impulse magnetron sputtering.

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Section: Introductionmentioning

confidence: 99%

Plasma potential of a moving ionization zone in DC magnetron sputtering

Panjan

Anders

2017

Journal of Applied Physics

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“…It has been shown that in HiPIMS, the plasma expansion is associated with a high plasma density peak moving from the target towards the substrate with the magnetic field strength controlling the downstream plasma distribution. 16 The "Spiral" magnet pack described in Yu et al 17 showed a flattened downstream plasma density distribution in HiPIMS. Also, TLP measurements on "Spiral" magnetic field pattern demonstrated more uniform downstream plasma density compared to the other magnetic field patterns tested in that work.…”

Section: / Trimentioning

confidence: 98%

A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations

Raman

Weberski

Cheng

et al. 2016

Journal of Applied Physics

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High Power Impulse Magnetron Sputtering (HiPIMS) is one of the recent developments in the field of magnetron sputtering technology that is capable of producing high performance, high quality thin films. Commercial implementation of HiPIMS technology has been a huge challenge due to its lower deposition rates compared to direct current Magnetron Sputtering. The cylindrically symmetric "TriPack" magnet pack for a 10 cm sputter magnetron that was developed at the Center for Plasma Material Interactions was able to produce higher deposition rates in HiPIMS compared to conventional pack HiPIMS for the same average power. The "TriPack" magnet pack in HiPIMS produces superior substrate uniformity without the need of substrate rotation in addition to producing higher metal ion fraction to the substrate when compared to the conventional pack HiPIMS [Raman et al., Surf. Coat. Technol. 293, 10 (2016)]. The films that are deposited using the "TriPack" magnet pack have much smaller grains compared to conventional pack DC and HiPIMS films. In this paper, the reasons behind the observed increase in HiPIMS deposition rates from the TriPack magnet pack along with a modified particle flux model is discussed. Published by AIP Publishing.

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“…ACCEPTED MANUSCRIPT 9 to the conventional pack discharge, as described by Thornton, J. A et al [17].…”

Section: Accepted Manuscriptmentioning

confidence: 99%

“…3 magnetic field profile on the magnetron target surface [8][9][10], plasma impedance [11], plasma instabilities [12] and power supply pulsing parameters [13,14].…”

Section: Accepted Manuscriptmentioning

confidence: 99%