1998 Help me understand this report
Dry etching of InP using a CH3Cl/Ar/H2 gas mixture with electron-cyclotron-resonance excitation
Abstract: Electrical evaluation of InP surface damage caused by reactive ion etching with a mixture of methane (CH4) or ethane (C2H6) and hydrogen (H2)
Search citation statements
Paper Sections
Select...
Citation Types
0
0
0
Year Published
2000
2000
Publication Types
Select...
1
Relationship
0
1
Authors
Journals
Cited by 1 publication
References 14 publications
(8 reference statements)
0
0
0
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.
Copyright © 2024 scite LLC. All rights reserved.
Made with 💙 for researchers
