2003
DOI: 10.1021/ac0313926
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Dynamic Reaction Cell ICPMS for Trace Metal Analysis of Semiconductor Materials

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Cited by 15 publications
(27 citation statements)
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“…The benefit of using O 2 in the DRC is in its ability of quantifying the specie 75 As 16 O + at mass 91, which is totally free of chloride-based polyatomic interferences, and gaining in sensitivity [67]. Direct determination of trace arsine in gas samples was achieved by determining arsenic as AsO, thus minimizing risks for species conversion during sample capturing and pretreatment [68].…”
Section: Arsenicmentioning
confidence: 99%
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“…The benefit of using O 2 in the DRC is in its ability of quantifying the specie 75 As 16 O + at mass 91, which is totally free of chloride-based polyatomic interferences, and gaining in sensitivity [67]. Direct determination of trace arsine in gas samples was achieved by determining arsenic as AsO, thus minimizing risks for species conversion during sample capturing and pretreatment [68].…”
Section: Arsenicmentioning
confidence: 99%
“…Low plasma temperatures may work well in the reduction of ClO + , but at ultratrace levels the energy of a cool plasma is not enough to break vanadium oxides and hydroxide molecular ions and V can not be quantified [67].…”
Section: Vanadiummentioning
confidence: 99%
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“…40 Ar + with 40 Ca + ), adducts that are formed through condensation (ca. 80 Ar 2 + with 80 Se + ), or polyatomic ions formed from solvent or matrix products (ca. 40 Ar 35 Cl + with 75 As + ).…”
Section: Mitigating Spectroscopic Interferences In Icp-msmentioning
confidence: 99%
“…ICP-MS 80 Se as analyte ion, CH4 as reaction gas, Ar as matrix ion ; (B) 40 Ca as analyte ion, CH4 as reaction gas, Ar as matrix ion ; (C) 51 V as analyte ion, NH3 as reaction gas, Cl and ClO as matrix ion …”
mentioning
confidence: 99%