Effect of Mo-Cu cathode composition on process stability, macroparticle formation, plasma generation, and thin-film deposition in DC arc synthesis

The expansion of non-ideal copper plasma into vacuum is analyzed for the conditions typical to explosive electron emission in vacuum arcs. The gas-dynamic model solves the Euler equations with an equation of state (EoS) for weakly non-ideal plasma taking into account the ionization energy correction due to electron-ion Coulomb coupling. We have obtained that the EoS has insignificant influence on the plasma expansion, when the plasma properties and composition change drastically. Based on our simulation results, the validity of the "frozen" state theory often used in the vacuum arcs plasma diagnostics is questionable.

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On the expansion of non-ideal copper plasma into vacuum

Levko

Arslanbekov

Kolobov

2020

Physics of Plasmas

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A comparison of plasma generation, plasma transport, and film formation for a DC vacuum arc source with Ti–X compound cathodes (X = W, C, Al, and Si)

Zhirkov

Polcik

Petruhins

et al. 2023

Journal of Applied Physics

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This investigation reports the influence of Ti–C and Ti–W cathode composition on an industrial-scale dc vacuum arc plasma source. Further, we analyze the influence of plasma generation and plasma properties on the resulting cathode surface after the operation and on basic film properties. The results are compared with previous work focused on Ti–Al and Ti–Si compound cathodes. For all Ti–X compound cathodes (X = W, C, Al, and Si), a direct correlation between plasma ion energy/charge and the cohesive energy of the cathode was demonstrated, with a small number of exceptions to a limited set of specific cathode compositions. Hence, the “velocity rule” and effects from different electron temperatures were suggested to be important for gaining a more detailed understanding of plasma properties. A discrepancy was found between the cathode and plasma ion composition, though the difference was reduced in a corresponding comparison between the cathode and the deposited film composition. A significant contribution of a flux of neutrals and/or macroparticles to the final film composition was, therefore, suggested. The effect of the melting point of the cathode phase composition on the intensity of macroparticle generation and the smoothness of the cathode surface operation was also investigated. The presented results contribute to the fundamental understanding of vacuum arc plasma generation and transport and are of importance for further development and applicability of Ti-based coatings from arc deposition.

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Effect of Mo-Cu cathode composition on process stability, macroparticle formation, plasma generation, and thin-film deposition in DC arc synthesis

Abstract: Effect of Mo-Cu cathode composition on process stability, macroparticle formation, plasma generation, and thin-film deposition in DC arc synthesis

Cited by 2 publications

References 20 publications

On the expansion of non-ideal copper plasma into vacuum

On the expansion of non-ideal copper plasma into vacuum

A comparison of plasma generation, plasma transport, and film formation for a DC vacuum arc source with Ti–X compound cathodes (X = W, C, Al, and Si)

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