Effect of NaF additive on the micro/nano-structure and properties of the microarc oxidation coating on Ti6Al4V alloy

Zhai, Dajun; Du, Dongfang; Hongqiang, Dou

doi:10.1142/s0217984919502658

Cited by 3 publications

(2 citation statements)

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“…Tsuchiya et al (2006) showed that lower pH values on fluoride media promote competition between the growth and dissolution of the oxide film, allowing nanotube shaped oxides to be formed. Zhai et al (2019) argue that titanium and its alloys present good mechanical properties as well as good biocompatibility, but they have no Research, Society and Development, v. 9, n. 11, e95791110689, 2020 (CC BY 4.0) | ISSN 2525-3409 | DOI: http://dx.doi.org/10.33448/rsd-v9i11.10689…”

Section: Introductionmentioning

confidence: 99%

“…This technique has been used in studies about optical parameters, oxide layer thickness related to electrochemical behaviour of titanium and its alloys, mainly in acidic or alkaline environments (Mardare & Hones, 1999;Blackwood et al, 1989). Atomic force microscopy (AFM) is a well-known and widely used technique to investigate the roughness and surface topography of the samples (Saldanha et al, 2020;Huang & Liu, 2013;Zhai et al, 2019).…”

Section: Introductionmentioning

confidence: 99%

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Effect of fluoride on the thickness, surface roughness and corrosion resistance of titanium anodic oxide films formed in a phosphate buffer solution at different applied potentials

Domingues

Oliveira

Ferreira

et al. 2020

RSD

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The anodizing process and anions type present in the electrolyte during anodic oxidation are important parameters to improve oxide biocompatibility. From these parameters, it is possible to control the thickness and surface roughness of the oxide film. This control is of major importance, once blood clots can be avoided when the oxide film on the metal substrate has a small surface roughness (Ra ≤ 50 nm). In this paper, the thickness, surface roughness, and corrosion resistance of the anodized titanium film were studied in a phosphate buffer solution containing fluoride anions (0.6 w.t % NaF), at 20 V, 40 V, 60 V, and 80 V, using atomic force microscopy (AFM), spectroscopic ellipsometry (SE), and electrochemical impedance spectroscopy (EIS) techniques. It was observed that thickness and roughness tend to increase as the applied potential rises. For oxides grown in the solution without NaF, the growth rate is roughly 1.3 ± 0.2 nm/V. Surface roughness generally presents the same behaviour. Moreover, EIS and SE thickness measurements agree at 20 V and 60 V but disagree at 80 V. This may be associated with a possible dielectric breakdown at 80 V. The oxide film formed at 60 V showed the best corrosion resistance in relation to the other studied potentials. Globular structures were also observed using AFM on surfaces at 40 V, 60 V, and 80 V, which suggests oxide film nucleation. Oxide films formed in solution with NaF presented lower thickness, excellent corrosion resistance, and low surface roughness (Ra ≤ 50 nm).

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Section: Introductionmentioning

confidence: 99%