Effect of Sputtering Parameters on the Magnetic Properties of SmCo₅/Cu Films

Abstract

SmCo 5 film is an emerging candidate for the recording material of future high density magnetic recording because of its huge uniaxial magneto-crystalline anisotropy. In this article, SmCo 5 films were fabricated by radio frequency (RF) magnetron sputtering system onto quartz glass substrate, and a Cu underlayer was proposed in order to improve magnetic properties of SmCo 5 films. The dependences of sputtering power, thickness and annealing temperature on the magnetic properties of SmCo 5 /Cu films were studied. Using the optimal sputtering parameters of sputtering power of 60 w, thickness of 65 nm, and annealing temperature of 650 C, the coercivity of SmCo 5 /Cu films is improved significantly.