Effect on surface roughness of zerodur material in atmospheric pressure plasma jet processing

Jin, Haoyu; Wang, B.; Zhang, F. H.

doi:10.1117/12.866683

Cited by 6 publications

(6 citation statements)

References 11 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Yao et al and Jin et al presented plasma machining of Zerodur using a RF-excited plasma jet at atmospheric pressure. It was shown that the surface roughness was strongly dependent on the process parameters and in particular on the mixing ratio of the working gas, SF 6 and O 2 [6,7]. However, such plasma figuring methods can provoke surface roughening due to inhomogeneous etching, an effect which was also observed in the case of reactive ion etching (RIE) of pyrex glass [8].…”

Section: Introductionmentioning

confidence: 99%

Polishing of optical media by dielectric barrier discharge inert gas plasma at atmospheric pressure

Gerhard

Weihs

Luca

et al. 2013

J. Eur. Opt. Soc.-Rapid Publ.

View full text Add to dashboard Cite

In this paper, surface smoothing of optical glasses, glass ceramic and sapphire using a low-power dielectric barrier discharge inert gas plasma at atmospheric pressure is presented. For this low temperature treatment method, no vacuum devices or chemicals are required. It is shown that by such plasma treatment the micro roughness and waviness of the investigated polished surfaces were significantly decreased, resulting in a decrease in surface scattering. Further, plasma polishing of lapped fused silica is introduced. Based on simulation results, a plasma physical process is suggested to be the underlying mechanism for initialising the observed smoothing effect.

show abstract

Section: Introductionmentioning

confidence: 99%

Polishing of optical media by dielectric barrier discharge inert gas plasma at atmospheric pressure

Gerhard

Weihs

Luca

et al. 2013

J. Eur. Opt. Soc.-Rapid Publ.

View full text Add to dashboard Cite

show abstract

“…Jin et al 58 evaluated the influence of various process parameters on APPJ processed zerodur substrates. Also, the modification of the surface chemistry is studied in detail.…”

Section: Plasma Polishing Methods Applied To Various Optical Componentsmentioning

confidence: 99%

“…The effect of dwelling time (min) and O 2 /SF 6 ratio on surface roughness (Figure 5(a) and (b), respectively), up to 30% improvement in the surface finish is obtained. 58 The relation between the substrate's surface roughness and the process parameters is reported based on the experimental results.…”

Section: Plasma Polishing Methods Applied To Various Optical Componentsmentioning

confidence: 99%

See 1 more Smart Citation

Plasma polishing processes applied on optical materials: A review

Yadav

Kumar

et al. 2021

Journal of Micromanufacturing

View full text Add to dashboard Cite

Nowadays, the surface quality of the material is crucial for industry and science. With the development of micro-electronics and optics, the demand for surface quality has become more and more rigorous, making optical surface polishing more and more critical. Plasma polishing technology is conceived as an essential tool for removing surface and subsurface damages from traditional polishing processes. The plasma processing technology is based on plasma chemical reactions and removes atomic-level materials. Plasma polishing can easily nano-finish hard-brittle materials such as ceramics, glass, crystal, fused silica, quartz, Safire, etc. The optical substrate with micro-level and nano-level surface roughness precision is in demand with the advancement in optics fabrication. The mechanical properties of super-finished optics materials are being used to fulfill the requirement of modern optics. This article discusses the processing of different types of freeform, complex and aspheric optical materials by the plasma polishing process used mainly by the optical industry. The plasma polishing devices developed in the last decade are thoroughly reviewed for their working principles, characteristics and applications. This article also examines the impact of various process parameters such as discharge power, rate of gas flow, mixed gas flow ratio and pressure on the plasma polishing process.

show abstract

“…The low-pressure (10 −2 -0.5 mbar) plasma method can reduce the subsurface damage on freeform and complex surfaces. The different working gases are successfully used in atmospheric pressure plasma to reduce the subsurface damages while achieving an ultralow surface finish [12][13][14]. APPP processes are limited to small apertures and do not apply to freeform surfaces.…”

Section: Introductionmentioning

confidence: 99%

Parametric optimisation of plasma polishing process using response surface methodology

Yadav

Das

2023

Surface Engineering

View full text Add to dashboard Cite

The plasma polishing process is one of the non-conventional techniques used to remove material at the atomic level from the substrate. During the polishing of the fused silica substrate, the process parameters, namely radio-frequency (RF) power, pressure ratio (SF 6 / O 2 ), and total pressure of the plasma chamber, are investigated and optimised for material removal rate (MRR) and % change in surface roughness (% ΔR a ) using response surface methodology. The optimum values obtained for MRR and % ΔR a are 0.012 mm 3 /min and 3.59, at RF power of 60 W, pressure ratio of 3, and total pressure of 14.3 mbar. The experimental results reveal that surface roughness slightly increases from 0.344 to 0.356 μm after plasma processing at optimised process conditions. Moreover, the plasma-processed fused silica substrate is characterised using field emission scanning electron microscopy and energy dispersive X-ray spectroscopy, which depict the presence of silicon, oxygen, and fluorine on the processed substrate.

show abstract

Effect on surface roughness of zerodur material in atmospheric pressure plasma jet processing

Cited by 6 publications

References 11 publications

Polishing of optical media by dielectric barrier discharge inert gas plasma at atmospheric pressure

Polishing of optical media by dielectric barrier discharge inert gas plasma at atmospheric pressure

Plasma polishing processes applied on optical materials: A review

Parametric optimisation of plasma polishing process using response surface methodology

Contact Info

Product

Resources

About