Effects of Plasma Parameter on Morphological and Electrical Properties of Superconducting Nb-N Deposited by MO-PEALD

Ziegler, Mario; Linzen, S.; Goerke, Sebastian; Brückner, U. B.; Plentz, Jonathan; Dellith, Jan; Himmerlich, Anja; Himmerlich, Marcel; Hübner, Uwe; Krischok, S.; Meyer, H.‐G.

doi:10.1109/tasc.2017.2744326

Cited by 14 publications

(16 citation statements)

References 26 publications

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“…A further increase in temperature leads to a decrease in the GPC. The GPC obtained by our process is lower than the value obtained by Ziegler et al [15], i.e., a saturated GPC of 0.045 nm/cycle for films deposited at 350 °C, using TBTDEN/H 2 plasma. This difference in the GPC might be due to the different growth conditions (such as additional step of NH 3 ) and consequent different film compositions (low amount of C and/or O impurities).…”

Section: Ald Windowcontrasting

confidence: 85%

“…shows that the density of the samples increased after annealing and S2 exhibited the highest density among all of the samples. existing information in previous studies on the ALD synthesis of NbN [14][15][16][17][18][19], the presence of carbon as an impurity in the classical ALD process could significantly impact the superconductivity. Therefore, the improvement of the Tc of our carbon-free samples after annealing is related to another parameter.…”

Section: Effect Of Annealing In Argonmentioning

confidence: 99%

“…Extremely interesting results (Tc: ~14 K for the ~30 nm thick film) have been reported using TBTDEN/H 2 [15,18] or TBTDEN/H 2 /N 2 [17,19]. Several authors [14,18] reported that the films may contain relatively high amounts of oxygen and carbon, up to 50 at%.…”

Section: Introductionmentioning

confidence: 96%

“…A prospective molecular precursor for NbN deposition is (tert-butylimido)-tris (diethylamino)-niobium(V) (TBTDEN), which can be combined with H 2 plasma [14,15].…”

Section: Introductionmentioning

confidence: 99%

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Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

et al. 2020

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The efficiency of the superconducting radio frequency cavities composed of Nb required the deposition of thickness-controlled multilayer coatings of superconductor-insulator-superconductor (S-IS) on the internal surfaces of the cavities. Herein, we report the plasma-enhanced atomic layer deposition of carbon-free NbN (50 µm thick), followed by a thermal treatment, to obtain the superconducting layer in the S-IS structure. Using (tert-butylimido)-tris(diethylamino)-niobium as the niobium precursor and H 2 and NH 3 plasma as reactive gases, the deposition and annealing parameters were optimized by studying their effects on the film properties (crystallinity, density, and composition). We demonstrated that the superconducting critical temperature (Tc) can be improved after thermal annealing up to 13.8 K, a value compatible with the targeted application. In addition to the expected densified layers and increased grain size, we observed a partial transformation of the oxide present in the as-deposited layer into niobium oxynitride, which could indicate the origin of the improvement of the superconducting properties. With low carbon and oxygen impurity concentrations in the films, this study contributes to the understanding of the relationship between the structure, composition, and superconductivity in NbN.

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Section: Ald Windowcontrasting

confidence: 85%

Section: Effect Of Annealing In Argonmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 96%

“…A prospective molecular precursor for NbN deposition is (tert-butylimido)-tris (diethylamino)-niobium(V) (TBTDEN), which can be combined with H 2 plasma [14,15].…”

Section: Introductionmentioning

confidence: 99%

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Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

et al. 2020

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“…One reason could be oxygen incorporation into the films as a result of the long ALD deposition times together with oxygen permeation into the deposition chamber. This results in growing defects (niobium oxide) in the deposited film and could lead to a decrease of the diffusion coefficient [16].…”

Section: Nbn Filmsmentioning

confidence: 99%

Nanowire single-photon detectors made of atomic layer-deposited niobium nitride

Knehr¹,

Kuzmin²,

Vodolazov³

et al. 2019

Supercond. Sci. Technol.

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We demonstrate and characterize first superconducting nanowire single-photon detectors (SNSPDs) made from atomic layer-deposited (ALD) NbN layers. To assess the suitability of these films as a detector material, transport properties of bare films and bridges of different dimensions and thicknesses are investigated. Similar ratios of the measured critical current to the depairing current are obtained for micro-bridges made from ALD and sputtered NbN films. Furthermore, we characterized the single-photon response for 5 and 10 nmthick nanowire detectors. A 100 nm-wide straight nanowire with a length of 5 µm exhibits saturated count-rate dependencies on bias current and a cut-off wavelength in the near-infrared range. The ALD technique could open up the possibility to fabricate NbN-based detectors on the wafer scale and to conformally cover also non-planar surfaces for novel device concepts.

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Mixed‐Anion Compounds: An Unexplored Playground for ALD Fabrication

Tripathi

Karppinen

2021

Adv Materials Inter

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For decades the most successful approach towards new inorganic material innovations for next‐generation devices has been to manipulate the cation composition. As this cation‐centric material development is inevitably approaching its saturation, new chemistries are needed to maintain the pace of technological progress. One of the new chemistry approaches is to play with the anions instead of the cations. Moreover, advances in fabrication techniques are needed to address the endeavors to shrink the device and component dimensions. Here, the combination of mixed‐anion chemistries, such as oxychalcogenides or carbopnictides, and the state‐of‐the‐art atomic layer deposition (ALD) thin‐film technology are highlighted. The unique bottom‐up material building mode of ALD can lead to scientifically exciting but at the same time industry‐feasible material innovations. In this brief review, the present status and prospects, and the challenges of this emerging field are discussed.

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Effects of Plasma Parameter on Morphological and Electrical Properties of Superconducting Nb-N Deposited by MO-PEALD

Cited by 14 publications

References 26 publications

Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

Nanowire single-photon detectors made of atomic layer-deposited niobium nitride

Mixed‐Anion Compounds: An Unexplored Playground for ALD Fabrication

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