2020
DOI: 10.1016/j.vacuum.2020.109201
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Electrical and carrier transport properties of Au/Pr6O11/n-GaN MIS structure with a high-k rare-earth oxide interlayer at high temperature range

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Cited by 13 publications
(3 citation statements)
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“…As mentioned above, the shape of the nkT versus kT curve in figure 10 tells us that the current transport mechanism across the device is controlled by the FE current. Therefore, we can suggest that the I -V characteristics of the forward bias in figure 7 agrees with FE model, as suggested in [101][102][103][104].…”
Section: High Voltage Regionsupporting
confidence: 79%
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“…As mentioned above, the shape of the nkT versus kT curve in figure 10 tells us that the current transport mechanism across the device is controlled by the FE current. Therefore, we can suggest that the I -V characteristics of the forward bias in figure 7 agrees with FE model, as suggested in [101][102][103][104].…”
Section: High Voltage Regionsupporting
confidence: 79%
“…This gives us information about assumption of the spatial inhomogeneous distribution of SB heights. Some authors [103][104][105][106][107][108][109][110][111][112][113][114][115][116] have suggested that the barrier inhomogeneities can form due to inhomogeneities in the interfacial layer composition, non-uniformity of the interfacial charges and interfacial thin layer. The presence of the spatial inhomogeneity or potential fluctuations at the contact materials can greatly affect the current across the device.…”
Section: High Voltage Regionmentioning
confidence: 99%
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