Electron beam evaporation of boron at forevacuum pressures for plasma-assisted deposition of boron-containing coatings

Abstract

We describe the use of a plasma-cathode electron source for electron beam evaporation of boron at forevacuum pressures (∼10 Pa) with subsequent deposition of boron-containing coatings on a titanium substrate. We analyze the process of electron beam heating and evaporation of boron, study the mass-to-charge composition of the gas and boron beam-produced plasma, apply such plasma for coating deposition, and investigate the elemental composition of the deposited film and its microhardness.

Electron-Beam Synthesis of Dielectric Coatings Using Forevacuum Plasma Electron Sources (Review)

“…When the critical electron-beam power is reached, the target begins to melt, and at a beam current of 200 mA and an accelerating voltage of 15-20 kV, the solid-body target evaporates, with the target temperature at this point being about 2500 °С. The temperature dependence of the boron target on the electron-beam power density is shown in Figure 29 [138]. The temperature dependence of the boron target on the electron-beam power density is shown in Figure 29 [138].…”

“…The temperature dependence of the boron target on the electron-beam power density is shown in Figure 29 [138]. The temperature dependence of the boron target on the electron-beam power density is shown in Figure 29 [138]. The duration of the entire process was 5 to 20 min depending on the target composition (B or BN).…”

Electron-beam Deposition of Ceramic Coatings

“…Mass-to-charge composition of ions of beam plasma produced as result of electron-beam of evaporation of ceramic target, was monitored using modified RGA-100 gas analyzer [6]. The picture of the coating was shot using the raster electron microscope Hitachi S3400N coupled to the EDS Bruker X'Flash 5010.…”

Formation of Nitride by Electron-Beam Irradiation of Titanium in Nitrogen Media

“…The mass-charge analysis of the plasma ions was carried out using the modified quadruple analyzer of the residual atmosphere RGA-100 located directly near the nitriding sample. The scheme for the measurement of the ion plasma constituents and the particular changes introduced in the analyzer design are discussed in detail in [4]. Since the process of nitriding supposes a long and intensive heating of the sample, and hence of the nearby region, the analyzer was removed for the duration of the process to avoid possible damage to its sealing materials and the mass-separator insulation.…”