2006
DOI: 10.1117/12.656516
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Electron beam lithography for high aspect-ratio trench patterning in thick resist: experimental and simulation results

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Cited by 4 publications
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“…Since the radiation efficiency, η r , for a transducer metallization thicknesses of 1 µm, dominates the match and dissipation efficiency, η r can be improved using thicker metallization (see thickness 2 µm dashed orange curve). For transducers launching exchange spin waves, fabrication methods capable of producing high aspect-ratios, such as 19 : 1 with SAFIER-complemented EBL 45 and greater than 100 : 1 with LIGA 46 , are likely required to maintain a high η r . To validate the theoretical approach, this CPW transducer and YIG film were modeled in HFSS by defining the magnetostatic Polder susceptibility tensor for the YIG film and a uniform bias field of B a = 0.3763 T to target the LTE-U band.…”
Section: Design Methodologymentioning
confidence: 99%
“…Since the radiation efficiency, η r , for a transducer metallization thicknesses of 1 µm, dominates the match and dissipation efficiency, η r can be improved using thicker metallization (see thickness 2 µm dashed orange curve). For transducers launching exchange spin waves, fabrication methods capable of producing high aspect-ratios, such as 19 : 1 with SAFIER-complemented EBL 45 and greater than 100 : 1 with LIGA 46 , are likely required to maintain a high η r . To validate the theoretical approach, this CPW transducer and YIG film were modeled in HFSS by defining the magnetostatic Polder susceptibility tensor for the YIG film and a uniform bias field of B a = 0.3763 T to target the LTE-U band.…”
Section: Design Methodologymentioning
confidence: 99%